Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Submicron doped tungsten oxide-based powder as well as preparation method and application thereof
The invention relates to submicron tungsten oxide-based powder and a preparation method and an application thereof. The total mass fraction of doped source elements in mixed powder is 5-50%, the dopedsource elements are selected from at least three of Ti, Mo, V, Al, Li and Zr, the purity of the mixed powder is larger than 99.95%, the average particle size is 500 nm-1800 nm, and the D50 particle size is 200-750 nm; wherein M1 is defined as the mass fraction of powder particles with the particle size of 50-100 nm, M2 is defined as the mass fraction of powder particles with the particle size of100-400 nm, M3 is defined as the mass fraction of powder particles with the particle size of 400-700 nm, M4 is defined as the mass fraction of powder particles with the particle size of 700 nm and 1 micron, M5 is defined as the mass fraction of powder particles with the particle size of more than 1 micron; then the quantitative relationship of M1, M2, M3, M4, and M5 conforms to the formula in thespecification:.
本发明涉及一种亚微米级氧化钨基粉体及制备方法和应用，混合粉体中掺杂源元素的总质量分数为5‑50％，掺杂源的掺杂元素选自Ti、Mo、V、Al、Li、Zr中的至少三种，混合粉体的纯度大于99.95％，平均粒径500nm‑1800nm，D50粒径在200‑750nm；定义M1为50‑100nm粒度段粉体颗粒质量分数，M2为100‑400nm粒度段粉体颗粒质量分数，M3为400‑700nm粒度段粉体颗粒质量分数，M4为700nm‑1μm粒度段粉体颗粒质量分数，M5为＞1μm粒度段粉体颗粒质量分数，那么M1、M2、M3、M4、M5的数量关系符合公式：
Submicron doped tungsten oxide-based powder as well as preparation method and application thereof
The invention relates to submicron tungsten oxide-based powder and a preparation method and an application thereof. The total mass fraction of doped source elements in mixed powder is 5-50%, the dopedsource elements are selected from at least three of Ti, Mo, V, Al, Li and Zr, the purity of the mixed powder is larger than 99.95%, the average particle size is 500 nm-1800 nm, and the D50 particle size is 200-750 nm; wherein M1 is defined as the mass fraction of powder particles with the particle size of 50-100 nm, M2 is defined as the mass fraction of powder particles with the particle size of100-400 nm, M3 is defined as the mass fraction of powder particles with the particle size of 400-700 nm, M4 is defined as the mass fraction of powder particles with the particle size of 700 nm and 1 micron, M5 is defined as the mass fraction of powder particles with the particle size of more than 1 micron; then the quantitative relationship of M1, M2, M3, M4, and M5 conforms to the formula in thespecification:.
本发明涉及一种亚微米级氧化钨基粉体及制备方法和应用，混合粉体中掺杂源元素的总质量分数为5‑50％，掺杂源的掺杂元素选自Ti、Mo、V、Al、Li、Zr中的至少三种，混合粉体的纯度大于99.95％，平均粒径500nm‑1800nm，D50粒径在200‑750nm；定义M1为50‑100nm粒度段粉体颗粒质量分数，M2为100‑400nm粒度段粉体颗粒质量分数，M3为400‑700nm粒度段粉体颗粒质量分数，M4为700nm‑1μm粒度段粉体颗粒质量分数，M5为＞1μm粒度段粉体颗粒质量分数，那么M1、M2、M3、M4、M5的数量关系符合公式：
Submicron doped tungsten oxide-based powder as well as preparation method and application thereof
一种亚微米级掺杂氧化钨基粉体及制备方法和应用
GAO MING (Autor:in) / ZHANG HU (Autor:in) / ZHANG HUARUI (Autor:in) / YANG BENRUN (Autor:in)
19.02.2021
Patent
Elektronische Ressource
Chinesisch
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