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The invention relates to a heat-resistant member. The heat-resistant member includes a base member composed of an isotropic graphite and a film with a single layer or multiple layers formed on the entire or partial surface of the base member. The film includes a dense WC layer with a single layer or multiple layers, and the dense WC layer includes WC as a main component and has a porosity of less than 3%. The film may further include a porous WC layer with a single layer or multiple layers formed on an entire or partial surface of the dense WC layer. In this case, the porous WC layer preferably includes WC as a main component and has a porosity larger than that of the dense WC layer.
本发明涉及一种耐热构件。耐热构件包含由各向同性石墨构成的基底构件;和在所述基底构件的整个或部分表面上形成的具有单层或多层的膜。所述膜包含具有单层或多层的致密WC层,并且所述致密WC层包含WC作为主要成分并且孔隙率小于3%。所述膜还可以包含在所述致密WC层的整个或部分表面上形成的具有单层或多层的多孔WC层。在这种情况下,所述多孔WC层优选包含WC作为主要成分并且孔隙率大于所述致密WC层。
The invention relates to a heat-resistant member. The heat-resistant member includes a base member composed of an isotropic graphite and a film with a single layer or multiple layers formed on the entire or partial surface of the base member. The film includes a dense WC layer with a single layer or multiple layers, and the dense WC layer includes WC as a main component and has a porosity of less than 3%. The film may further include a porous WC layer with a single layer or multiple layers formed on an entire or partial surface of the dense WC layer. In this case, the porous WC layer preferably includes WC as a main component and has a porosity larger than that of the dense WC layer.
本发明涉及一种耐热构件。耐热构件包含由各向同性石墨构成的基底构件;和在所述基底构件的整个或部分表面上形成的具有单层或多层的膜。所述膜包含具有单层或多层的致密WC层,并且所述致密WC层包含WC作为主要成分并且孔隙率小于3%。所述膜还可以包含在所述致密WC层的整个或部分表面上形成的具有单层或多层的多孔WC层。在这种情况下,所述多孔WC层优选包含WC作为主要成分并且孔隙率大于所述致密WC层。
HEAT-RESISTANT MEMBER
耐热构件
NAKAMURA TAISUKE (Autor:in)
28.05.2021
Patent
Elektronische Ressource
Chinesisch
IPC:
C04B
Kalk
,
LIME