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Ceramic vacuum coating process method
The invention relates to the field of coating processes, in particular to a ceramic vacuum coating process method. The ceramic vacuum coating process method comprises the following steps of S1, putting a ceramic base material into a vacuum chamber and vacuumizing, S2, filling inert gas into the vacuum chamber, S3, starting a bias power supply to adjust parameters of the bias power supply and starting a rotating stand, S4, coating of the ceramic base material comprising the following substeps: S4.1, heating and deflating the ceramic base material, S4.2, starting a first preset metal target to etch the ceramic base material, S4.3, closing the first preset metal target and starting a second preset metal target to carry out bottoming on the ceramic base material, S4.4, closing the first preset metal target and the second preset metal target, and starting a third preset metal target to coat the ceramic base material with a film, and S5, reducing the temperature of the vacuum chamber. According to the method, the ceramic base material is sequentially subjected to preheating deflation, etching, bottoming and film coating, so that the uniformity and the adhesion degree of the coating are improved, and the quality of the filter is further improved.
本申请涉及镀膜工艺领域,尤其是涉及一种陶瓷真空镀膜工艺方法。陶瓷真空镀膜工艺方法包括如下步骤:S1:将陶瓷基材放入真空室内并抽真空;S2:向真空室充入惰性气体;S3:开启偏压电源调节偏压电源的参数;开启转架;S4:对陶瓷基材镀膜包括如下步骤:S4.1:对陶瓷基材加热放气;S4.2:开启第一预设金属靶对陶瓷基材刻蚀;S4.3:关闭第一预设金属靶;开启第二预设金属靶对陶瓷基材打底;S4.4:关闭第一预设金属靶和第二预设金属靶;开启第三预设金属靶对陶瓷基材镀膜;S5:降低真空室温度。本申请通过对陶瓷基材依次进行预热放气、刻蚀、打底及镀膜,提升了镀层的均匀性和镀层的附着度,进而提升了滤波器的质量。
Ceramic vacuum coating process method
The invention relates to the field of coating processes, in particular to a ceramic vacuum coating process method. The ceramic vacuum coating process method comprises the following steps of S1, putting a ceramic base material into a vacuum chamber and vacuumizing, S2, filling inert gas into the vacuum chamber, S3, starting a bias power supply to adjust parameters of the bias power supply and starting a rotating stand, S4, coating of the ceramic base material comprising the following substeps: S4.1, heating and deflating the ceramic base material, S4.2, starting a first preset metal target to etch the ceramic base material, S4.3, closing the first preset metal target and starting a second preset metal target to carry out bottoming on the ceramic base material, S4.4, closing the first preset metal target and the second preset metal target, and starting a third preset metal target to coat the ceramic base material with a film, and S5, reducing the temperature of the vacuum chamber. According to the method, the ceramic base material is sequentially subjected to preheating deflation, etching, bottoming and film coating, so that the uniformity and the adhesion degree of the coating are improved, and the quality of the filter is further improved.
本申请涉及镀膜工艺领域,尤其是涉及一种陶瓷真空镀膜工艺方法。陶瓷真空镀膜工艺方法包括如下步骤:S1:将陶瓷基材放入真空室内并抽真空;S2:向真空室充入惰性气体;S3:开启偏压电源调节偏压电源的参数;开启转架;S4:对陶瓷基材镀膜包括如下步骤:S4.1:对陶瓷基材加热放气;S4.2:开启第一预设金属靶对陶瓷基材刻蚀;S4.3:关闭第一预设金属靶;开启第二预设金属靶对陶瓷基材打底;S4.4:关闭第一预设金属靶和第二预设金属靶;开启第三预设金属靶对陶瓷基材镀膜;S5:降低真空室温度。本申请通过对陶瓷基材依次进行预热放气、刻蚀、打底及镀膜,提升了镀层的均匀性和镀层的附着度,进而提升了滤波器的质量。
Ceramic vacuum coating process method
陶瓷真空镀膜工艺方法
WANG JUN (Autor:in) / WANG SIHANG (Autor:in) / YAN CHAOYING (Autor:in) / LI CHANGHUA (Autor:in)
09.07.2021
Patent
Elektronische Ressource
Chinesisch
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