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Preparation method of fine indium sulfide powder and target material
The invention discloses a preparation method of fine indium sulfide powder and a target material, and the preparation method of the fine indium sulfide powder comprises the following steps: introducing H2S gas into an In2 (SO4) 3 solution, reacting under stirring to synthesize indium sulfide, and after the reaction is finished, rinsing, filtering, calcining, ball-milling and sieving the synthesized product to obtain indium sulfide powder with the particle size D90 of 20-40 [mu] m; and allowing the indium sulfide powder to be subjected to airflow crushing, wherein the feeding pressure and crushing pressure of airflow crushing are 8-12 kg, the feeding speed is 3-5 kg/h, and continuing ventilation for 3-5 min after feeding is finished to obtain the fine indium sulfide powder with D90 smaller than 5 micrometers. The prepared indium sulfide powder is beta-In2S3 of a tetragonal structure, the particle size D90 is smaller than 5 microns, the indium sulfide powder is used for preparing the target material, the quality of the target material is improved, the average grain size of the target material is smaller than 5 microns, the resistivity is smaller than 0.5 K omega/cm, the relative density is larger than or equal to 97%, the impurity content is low, and a film formed through sputtering is good in stability, uniform in thickness distribution and consistent in grain size.
本发明公开了一种微细硫化铟粉体及靶材的制备方法,所述微细硫化铟粉体的制备方法包括如下步骤:将H2S气体通入In2(SO4)3溶液中,搅拌下反应合成硫化铟,反应结束后,对合成产物进行漂洗、过滤、煅烧、球磨及过筛,得到粒度D90为20~40μm的硫化铟粉体;将硫化铟粉体进行气流粉碎,气流粉碎的加料压力和粉碎压力为8~12kg,加料速度为3~5kg/h的匀速,加料结束后继续通气3~5min,得到D90<5μm的微细硫化铟粉体。本发明制得的硫化铟粉体为四方结构的β‑In2S3,粒度D90<5μm,将其用于制备靶材,利于提高靶材的品质,使靶材的平均晶粒度<5μm,电阻率<0.5KΩ/cm,相对密度≥97%,杂质含量低,溅射所形成薄膜的稳定性好、厚度分布均匀、及晶粒大小一致。
Preparation method of fine indium sulfide powder and target material
The invention discloses a preparation method of fine indium sulfide powder and a target material, and the preparation method of the fine indium sulfide powder comprises the following steps: introducing H2S gas into an In2 (SO4) 3 solution, reacting under stirring to synthesize indium sulfide, and after the reaction is finished, rinsing, filtering, calcining, ball-milling and sieving the synthesized product to obtain indium sulfide powder with the particle size D90 of 20-40 [mu] m; and allowing the indium sulfide powder to be subjected to airflow crushing, wherein the feeding pressure and crushing pressure of airflow crushing are 8-12 kg, the feeding speed is 3-5 kg/h, and continuing ventilation for 3-5 min after feeding is finished to obtain the fine indium sulfide powder with D90 smaller than 5 micrometers. The prepared indium sulfide powder is beta-In2S3 of a tetragonal structure, the particle size D90 is smaller than 5 microns, the indium sulfide powder is used for preparing the target material, the quality of the target material is improved, the average grain size of the target material is smaller than 5 microns, the resistivity is smaller than 0.5 K omega/cm, the relative density is larger than or equal to 97%, the impurity content is low, and a film formed through sputtering is good in stability, uniform in thickness distribution and consistent in grain size.
本发明公开了一种微细硫化铟粉体及靶材的制备方法,所述微细硫化铟粉体的制备方法包括如下步骤:将H2S气体通入In2(SO4)3溶液中,搅拌下反应合成硫化铟,反应结束后,对合成产物进行漂洗、过滤、煅烧、球磨及过筛,得到粒度D90为20~40μm的硫化铟粉体;将硫化铟粉体进行气流粉碎,气流粉碎的加料压力和粉碎压力为8~12kg,加料速度为3~5kg/h的匀速,加料结束后继续通气3~5min,得到D90<5μm的微细硫化铟粉体。本发明制得的硫化铟粉体为四方结构的β‑In2S3,粒度D90<5μm,将其用于制备靶材,利于提高靶材的品质,使靶材的平均晶粒度<5μm,电阻率<0.5KΩ/cm,相对密度≥97%,杂质含量低,溅射所形成薄膜的稳定性好、厚度分布均匀、及晶粒大小一致。
Preparation method of fine indium sulfide powder and target material
一种微细硫化铟粉体及靶材的制备方法
SHEN WENXING (Autor:in) / BAI PINGPING (Autor:in) / TONG PEIYUN (Autor:in) / XIE XIAOHAO (Autor:in)
06.08.2021
Patent
Elektronische Ressource
Chinesisch
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