Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Porcelain glazed brick polishing glaze suitable for low-temperature fast firing and preparation method thereof
The invention provides a porcelain glazed brick polishing glaze suitable for low-temperature fast firing and a preparation method thereof, and relates to the technical field of building materials, the porcelain glazed brick polishing glaze suitable for low-temperature fast firing comprises the following components by weight: 3-5% of potassium feldspar, 30-32% of albite, 8-10% of dolomite, 10-12% of fired talc, 4-5% of zinc oxide, 11% of barium carbonate, and the balance of water. The wollastonite glaze is prepared from, by weight, 3-4% of wollastonite, 5% of quartz, 9% of calcite, 0-1% of aluminum oxide, 8% of kaolin and 2-4% of calcined soil. Compared with an existing conventional formula, potassium feldspar is reduced, albite is increased, the trial melting point of the glaze is lowered, the glaze can adapt to lower firing temperature, calcite is increased, the high-temperature viscosity of the glaze can be reduced to the maximum extent, the surface tension of the glaze in the melting reaction process can be reduced, and the service life of the glaze is prolonged. Therefore, compared with conventional glaze, bubbles in a green body and a glaze pump can be removed after a liquid phase is melted in advance, pinhole melting holes caused by insufficient exhaust are controlled in a limited manner, the problem of coarse pores after polishing is effectively solved, and the progress is remarkable.
本发明提供一种适合低温快烧的瓷质抛釉砖抛釉釉料及其制备方法，涉及建材技术领域，所述适合低温快烧的瓷质抛釉砖抛釉釉料按重量百分比包括下列组分：钾长石3‑5％，钠长石30‑32％，白云石8‑10％，烧滑石10‑12％，氧化锌4‑5％，碳酸钡11％，硅灰石3‑4％，石英5％，方解石9％，氧化铝0‑1％，高岭土8％，煅烧土2‑4％。本发明相比现有常规配方钾长石减少，钠长石增多，使得釉料的试熔点变低，可以适应更低的烧成温度，方解石增多，可以最大程度的降低釉料的高温粘度，降低釉料熔融反应时的表面张力，从而比常规釉料提前熔融液相后也可以排除坯体和釉泵中的气泡，有限的控制了因排气不充分造成的针孔熔洞，也有效的解决了抛光后毛孔粗大的问题，进步性显著。
Porcelain glazed brick polishing glaze suitable for low-temperature fast firing and preparation method thereof
The invention provides a porcelain glazed brick polishing glaze suitable for low-temperature fast firing and a preparation method thereof, and relates to the technical field of building materials, the porcelain glazed brick polishing glaze suitable for low-temperature fast firing comprises the following components by weight: 3-5% of potassium feldspar, 30-32% of albite, 8-10% of dolomite, 10-12% of fired talc, 4-5% of zinc oxide, 11% of barium carbonate, and the balance of water. The wollastonite glaze is prepared from, by weight, 3-4% of wollastonite, 5% of quartz, 9% of calcite, 0-1% of aluminum oxide, 8% of kaolin and 2-4% of calcined soil. Compared with an existing conventional formula, potassium feldspar is reduced, albite is increased, the trial melting point of the glaze is lowered, the glaze can adapt to lower firing temperature, calcite is increased, the high-temperature viscosity of the glaze can be reduced to the maximum extent, the surface tension of the glaze in the melting reaction process can be reduced, and the service life of the glaze is prolonged. Therefore, compared with conventional glaze, bubbles in a green body and a glaze pump can be removed after a liquid phase is melted in advance, pinhole melting holes caused by insufficient exhaust are controlled in a limited manner, the problem of coarse pores after polishing is effectively solved, and the progress is remarkable.
本发明提供一种适合低温快烧的瓷质抛釉砖抛釉釉料及其制备方法，涉及建材技术领域，所述适合低温快烧的瓷质抛釉砖抛釉釉料按重量百分比包括下列组分：钾长石3‑5％，钠长石30‑32％，白云石8‑10％，烧滑石10‑12％，氧化锌4‑5％，碳酸钡11％，硅灰石3‑4％，石英5％，方解石9％，氧化铝0‑1％，高岭土8％，煅烧土2‑4％。本发明相比现有常规配方钾长石减少，钠长石增多，使得釉料的试熔点变低，可以适应更低的烧成温度，方解石增多，可以最大程度的降低釉料的高温粘度，降低釉料熔融反应时的表面张力，从而比常规釉料提前熔融液相后也可以排除坯体和釉泵中的气泡，有限的控制了因排气不充分造成的针孔熔洞，也有效的解决了抛光后毛孔粗大的问题，进步性显著。
Porcelain glazed brick polishing glaze suitable for low-temperature fast firing and preparation method thereof
一种适合低温快烧的瓷质抛釉砖抛釉釉料及其制备方法
YANG WENDUAN (Autor:in) / CHEN JIAHUI (Autor:in)
05.04.2022
Patent
Elektronische Ressource
Chinesisch
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