Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Foundation pit dewatering well water level real-time monitoring method
The invention discloses a real-time monitoring method for the water level of a foundation pit dewatering well. The real-time monitoring method comprises the following steps that a safe water level upper limit HS1 and an over-pumping control water level HS2 are preset in a controller; the water pump is put into the foundation pit dewatering well, and the putting depth of the water pump is located below the super-pumping control water level; the initial water level H0 of the water surface is measured through a laser range finder, and the water level is located between the HS2 and the HS1; a lifting device is used for lowering the water level real-time monitoring device into a foundation pit dewatering well, and the top standard HD of the positive plate is measured; the depth a of the positive plate inserted into the water is calculated, the real-time water level HSS of the foundation pit dewatering well is calculated, the controller controls the water pump to work, and the real-time water level HSS of the foundation pit dewatering well is made to meet the condition that HS2 < = HSS < = HS1 all the time. According to the method, the water level in the foundation pit dewatering well is accurately measured through the monitoring device, the controller controls the flow of the water pump, the real-time water level is accurately controlled, and therefore safety guarantee is provided for foundation pit excavation.
本发明公开了一种基坑降水井水位实时监控方法，包括如下步骤：在控制器中预设安全水位上限HS1、超抽控制水位HS2；将水泵放入基坑降水井中，使水泵的放入深度位于超抽控制水位下方；利用激光测距仪测量水面初始水位H0，使水位位于HS2、HS1之间；利用提升装置将水位实时监测装置下放至基坑降水井中，测量出正极板顶部标HD；计算正极板插入水中深度a，并计算基坑降水井实时水位HSS，控制器控制水泵工作，使基坑降水井实时水位HSS始终满足HS2≤HSS≤HS1。该方法通过监测装置精准测量基坑降水井中的水位，控制器对水泵流量进行控制，使实时水位得以精确控制，从而为基坑开挖提供安全保障。
Foundation pit dewatering well water level real-time monitoring method
The invention discloses a real-time monitoring method for the water level of a foundation pit dewatering well. The real-time monitoring method comprises the following steps that a safe water level upper limit HS1 and an over-pumping control water level HS2 are preset in a controller; the water pump is put into the foundation pit dewatering well, and the putting depth of the water pump is located below the super-pumping control water level; the initial water level H0 of the water surface is measured through a laser range finder, and the water level is located between the HS2 and the HS1; a lifting device is used for lowering the water level real-time monitoring device into a foundation pit dewatering well, and the top standard HD of the positive plate is measured; the depth a of the positive plate inserted into the water is calculated, the real-time water level HSS of the foundation pit dewatering well is calculated, the controller controls the water pump to work, and the real-time water level HSS of the foundation pit dewatering well is made to meet the condition that HS2 < = HSS < = HS1 all the time. According to the method, the water level in the foundation pit dewatering well is accurately measured through the monitoring device, the controller controls the flow of the water pump, the real-time water level is accurately controlled, and therefore safety guarantee is provided for foundation pit excavation.
本发明公开了一种基坑降水井水位实时监控方法，包括如下步骤：在控制器中预设安全水位上限HS1、超抽控制水位HS2；将水泵放入基坑降水井中，使水泵的放入深度位于超抽控制水位下方；利用激光测距仪测量水面初始水位H0，使水位位于HS2、HS1之间；利用提升装置将水位实时监测装置下放至基坑降水井中，测量出正极板顶部标HD；计算正极板插入水中深度a，并计算基坑降水井实时水位HSS，控制器控制水泵工作，使基坑降水井实时水位HSS始终满足HS2≤HSS≤HS1。该方法通过监测装置精准测量基坑降水井中的水位，控制器对水泵流量进行控制，使实时水位得以精确控制，从而为基坑开挖提供安全保障。
Foundation pit dewatering well water level real-time monitoring method
一种基坑降水井水位实时监控方法
WANG XINXIN (Autor:in) / CHENG ZICONG (Autor:in) / ZHANG AJIN (Autor:in)
17.05.2022
Patent
Elektronische Ressource
Chinesisch
IPC:
G01F
Messen des Volumens, des Durchflussvolumens, des Massendurchflusses oder des Füllstandes
,
MEASURING VOLUME, VOLUME FLOW, MASS FLOW, OR LIQUID LEVEL
/
E02D
FOUNDATIONS
,
Gründungen
/
F04B
Verdrängerkraft- und Verdrängerarbeitsmaschinen für Flüssigkeiten
,
POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS
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