Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Hybrid chemical-physical vapor deposition process for synthesizing environmental barrier coatings
Manufacturing methods for synthesizing environmental barrier coating systems (EBCs) that protect Si-based ceramic matrix composite (CMC) materials from oxidation and volatilization at elevated temperatures are disclosed. The method of manufacture is performed in vacuum and includes the step of depositing a silicon bond coating and an oxygen-containing barrier coating. The method is supported by plasma, preferably by arc discharge, which results in complete dissociation of a gas precursor, such as silane. Plasma is also used to pre-treat a substrate in an uninterrupted process chain. Deposition systems with substantially vacuum and plasma components and EBC coatings made by the methods are disclosed.
公开了用于合成环境阻隔涂层系统(EBC)的制造方法，所述环境阻隔涂层系统保护Si基陶瓷基质复合(CMC)材料在高温下免于氧化和挥发。该制造方法在真空中进行，并包括沉积硅结合涂层和含氧阻隔涂层的步骤。该方法由等离子体支持，优选通过和电弧放电，其导致气体前体如硅烷的完全离解。等离子体也用于在不中断的工艺链中预处理基材。公开了具有基本真空和等离子体组分的沉积系统以及通过所述方法制造的EBC涂层。
Hybrid chemical-physical vapor deposition process for synthesizing environmental barrier coatings
Manufacturing methods for synthesizing environmental barrier coating systems (EBCs) that protect Si-based ceramic matrix composite (CMC) materials from oxidation and volatilization at elevated temperatures are disclosed. The method of manufacture is performed in vacuum and includes the step of depositing a silicon bond coating and an oxygen-containing barrier coating. The method is supported by plasma, preferably by arc discharge, which results in complete dissociation of a gas precursor, such as silane. Plasma is also used to pre-treat a substrate in an uninterrupted process chain. Deposition systems with substantially vacuum and plasma components and EBC coatings made by the methods are disclosed.
公开了用于合成环境阻隔涂层系统(EBC)的制造方法，所述环境阻隔涂层系统保护Si基陶瓷基质复合(CMC)材料在高温下免于氧化和挥发。该制造方法在真空中进行，并包括沉积硅结合涂层和含氧阻隔涂层的步骤。该方法由等离子体支持，优选通过和电弧放电，其导致气体前体如硅烷的完全离解。等离子体也用于在不中断的工艺链中预处理基材。公开了具有基本真空和等离子体组分的沉积系统以及通过所述方法制造的EBC涂层。
Hybrid chemical-physical vapor deposition process for synthesizing environmental barrier coatings
用于合成环境阻隔涂层的混合化学-物理气相沉积方法
CHEN DIANYING (Autor:in) / WIEDRIG BENO (Autor:in) / RAMM JUERGEN (Autor:in)
22.10.2024
Patent
Elektronische Ressource
Chinesisch
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