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Combined deviation rectifying method for inclination of open caisson of rotational flow well
The invention relates to the field of deep foundations serving as lower structures, in particular to a rotational flow well open caisson inclination combined deviation rectifying method. The rotational flow well open caisson inclination combined deviation rectifying method is characterized by being implemented according to the following steps in sequence: S1, carrying out analysis according to a geological exploration report; s2, sinking resistance; s3, counterweight is carried out; s4, drilling is conducted; s5, arranging a hydraulic jack; s6, partial soil removal; and S7, repeating cooperative implementation of the steps S5 and S6. The construction quality is good.
本发明涉及作为下部结构的深基础领域,具体为一种旋流井沉井倾斜组合纠偏方法。一种旋流井沉井倾斜组合纠偏方法,其特征是:按如下步骤依次实施:S1:根据地勘报告进行分析;S2:阻沉;S3:配重;S4:钻孔;S5:布置液压千斤顶;S6:偏除土;S7:S5、S6重复配合实施。本发明施工质量好。
Combined deviation rectifying method for inclination of open caisson of rotational flow well
The invention relates to the field of deep foundations serving as lower structures, in particular to a rotational flow well open caisson inclination combined deviation rectifying method. The rotational flow well open caisson inclination combined deviation rectifying method is characterized by being implemented according to the following steps in sequence: S1, carrying out analysis according to a geological exploration report; s2, sinking resistance; s3, counterweight is carried out; s4, drilling is conducted; s5, arranging a hydraulic jack; s6, partial soil removal; and S7, repeating cooperative implementation of the steps S5 and S6. The construction quality is good.
本发明涉及作为下部结构的深基础领域,具体为一种旋流井沉井倾斜组合纠偏方法。一种旋流井沉井倾斜组合纠偏方法,其特征是:按如下步骤依次实施:S1:根据地勘报告进行分析;S2:阻沉;S3:配重;S4:钻孔;S5:布置液压千斤顶;S6:偏除土;S7:S5、S6重复配合实施。本发明施工质量好。
Combined deviation rectifying method for inclination of open caisson of rotational flow well
旋流井沉井倾斜组合纠偏方法
LIU HANG (Autor:in) / PAN ZHEN (Autor:in) / CHENG QINQIN (Autor:in) / DU CHENGLIN (Autor:in) / YANG WEI (Autor:in)
03.12.2024
Patent
Elektronische Ressource
Chinesisch
IPC:
E02D
FOUNDATIONS
,
Gründungen
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