Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Prestress jacking device in foundation pit and prestress applying method
The invention discloses a prestress jacking device in a foundation pit and a prestress applying method. The prestress jacking device comprises a loading base (11) and two diagonal bracing mechanisms (12), each diagonal bracing mechanism is provided with a top bracing output end, the two diagonal bracing mechanisms are respectively an upper diagonal bracing mechanism (128) and a lower diagonal bracing mechanism (129), and the lower diagonal bracing mechanism obliquely downwards extends out of the top bracing output end to be supported at the position, close to the pit bottom, of the enclosure and applies top bracing prestress to the position, close to the pit bottom, of the enclosure; the upper inclined strut mechanism obliquely and upwards extends out of the top support output end to be supported on the upper portion of the enclosure close to the bottom support. The prestress applying method comprises the steps that after construction of the near-pit-bottom horizontal support is completed, the prestress jacking and supporting device (1) is installed on the basis of the near-pit-bottom horizontal support, installation is completed before subsequent digging operation of a lower layer, and then jacking and supporting prestress is applied to the enclosure structure (2) through the prestress jacking and supporting device. And the part, close to the pit bottom, of the enclosure can obtain the top bracing prestress at the first time.
本发明公开了一种基坑内预应力顶撑装置和施加预应力方法。本发明的预应力顶撑装置包括加载基座(11)和两斜撑机构(12)；斜撑机构具有顶撑输出端，两斜撑机构分别为上斜撑机构(128)和下斜撑机构(129)，下斜撑机构斜向下伸出顶撑输出端顶撑在围护近坑底部位处，并对围护近坑底部位施加顶撑预应力；上斜撑机构斜向上伸出顶撑输出端顶撑在围护近底支撑上部处。本发明的施加预应力方法包括：在完成近坑底水平支撑的构建之后基于近坑底水平支撑安装预应力顶撑装置(1)，并且在后续下阶层掘土作业前完成安装，然后利用预应力顶撑装置对围护结构(2)施加顶撑预应力。围护近坑底部位能够在第一时间获得施加顶撑预应力。
Prestress jacking device in foundation pit and prestress applying method
The invention discloses a prestress jacking device in a foundation pit and a prestress applying method. The prestress jacking device comprises a loading base (11) and two diagonal bracing mechanisms (12), each diagonal bracing mechanism is provided with a top bracing output end, the two diagonal bracing mechanisms are respectively an upper diagonal bracing mechanism (128) and a lower diagonal bracing mechanism (129), and the lower diagonal bracing mechanism obliquely downwards extends out of the top bracing output end to be supported at the position, close to the pit bottom, of the enclosure and applies top bracing prestress to the position, close to the pit bottom, of the enclosure; the upper inclined strut mechanism obliquely and upwards extends out of the top support output end to be supported on the upper portion of the enclosure close to the bottom support. The prestress applying method comprises the steps that after construction of the near-pit-bottom horizontal support is completed, the prestress jacking and supporting device (1) is installed on the basis of the near-pit-bottom horizontal support, installation is completed before subsequent digging operation of a lower layer, and then jacking and supporting prestress is applied to the enclosure structure (2) through the prestress jacking and supporting device. And the part, close to the pit bottom, of the enclosure can obtain the top bracing prestress at the first time.
本发明公开了一种基坑内预应力顶撑装置和施加预应力方法。本发明的预应力顶撑装置包括加载基座(11)和两斜撑机构(12)；斜撑机构具有顶撑输出端，两斜撑机构分别为上斜撑机构(128)和下斜撑机构(129)，下斜撑机构斜向下伸出顶撑输出端顶撑在围护近坑底部位处，并对围护近坑底部位施加顶撑预应力；上斜撑机构斜向上伸出顶撑输出端顶撑在围护近底支撑上部处。本发明的施加预应力方法包括：在完成近坑底水平支撑的构建之后基于近坑底水平支撑安装预应力顶撑装置(1)，并且在后续下阶层掘土作业前完成安装，然后利用预应力顶撑装置对围护结构(2)施加顶撑预应力。围护近坑底部位能够在第一时间获得施加顶撑预应力。
Prestress jacking device in foundation pit and prestress applying method
基坑内预应力顶撑装置和施加预应力方法
YIN JI (Autor:in) / LI XIANG (Autor:in) / KONG LINGRONG (Autor:in) / ZHANG QIRUI (Autor:in) / WEI JIAQI (Autor:in) / LIU YIN (Autor:in) / JIN QI (Autor:in) / SHANG QI (Autor:in)
13.12.2024
Patent
Elektronische Ressource
Chinesisch
IPC:
E02D
FOUNDATIONS
,
Gründungen
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