Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
PROCESS FOR PREPARING CERAMIC, CERAMIC THUS OBTAINED AND USE THEREOF, PARTICULARLY AS SPATTERING TARGET
PROBLEM TO BE SOLVED: To provide a process for easily obtaining ceramic having high density and large surface area advantageously in a single heating step, without being assisted by a costly technology which is hot pressing, or a tricky demolding of a compacted target before it is sintered.SOLUTION: There is provided a process for preparing ceramic from an inorganic base material which is in a form of a powder having a dof 10 nm to 50 μm and having a high melting point of above 300°C. The process comprises a step of mixing the powder of the inorganic base material with a second inorganic constitutional element which has a powder form as well and acts as a dopant for the inorganic base material, and a sintering step carried out at high temperature of above 800°C, preferably above 1000°C, the dopant being constituted by a mixture of at least two inorganic material which has a dopant effect on a single inorganic material or the inorganic base material.SELECTED DRAWING: Figure 2B
【課題】高温プレス加工というコストのかかる技術、又は焼結前の圧密された標的の細心の離型方法を援用することなく、有利には単一の加熱ステップにおいて密度の高い、大きな表面積のセラミックを容易に得る方法の提供。【解決手段】３００℃超の高い融点を持つｄ５０が１０ｎｍ〜５０μｍの粉末の形をした無機基本材料からセラミックスを調整する方法であって、無機基本材料の粉末と、同じく粉末形態であり無機基本材料のためのドーパントとして作用する第２の無機構成要素とを混合するステップを含み、ドーパントが単一の無機材料又は無機基本材料に対するドーパント効果をもつ少なくとも２つの無機材料の混合物により構成されており、更に、８００℃超、好ましくは１０００℃超の高温で実施される焼結ステップを含む方法。【選択図】図２Ｂ
PROCESS FOR PREPARING CERAMIC, CERAMIC THUS OBTAINED AND USE THEREOF, PARTICULARLY AS SPATTERING TARGET
PROBLEM TO BE SOLVED: To provide a process for easily obtaining ceramic having high density and large surface area advantageously in a single heating step, without being assisted by a costly technology which is hot pressing, or a tricky demolding of a compacted target before it is sintered.SOLUTION: There is provided a process for preparing ceramic from an inorganic base material which is in a form of a powder having a dof 10 nm to 50 μm and having a high melting point of above 300°C. The process comprises a step of mixing the powder of the inorganic base material with a second inorganic constitutional element which has a powder form as well and acts as a dopant for the inorganic base material, and a sintering step carried out at high temperature of above 800°C, preferably above 1000°C, the dopant being constituted by a mixture of at least two inorganic material which has a dopant effect on a single inorganic material or the inorganic base material.SELECTED DRAWING: Figure 2B
【課題】高温プレス加工というコストのかかる技術、又は焼結前の圧密された標的の細心の離型方法を援用することなく、有利には単一の加熱ステップにおいて密度の高い、大きな表面積のセラミックを容易に得る方法の提供。【解決手段】３００℃超の高い融点を持つｄ５０が１０ｎｍ〜５０μｍの粉末の形をした無機基本材料からセラミックスを調整する方法であって、無機基本材料の粉末と、同じく粉末形態であり無機基本材料のためのドーパントとして作用する第２の無機構成要素とを混合するステップを含み、ドーパントが単一の無機材料又は無機基本材料に対するドーパント効果をもつ少なくとも２つの無機材料の混合物により構成されており、更に、８００℃超、好ましくは１０００℃超の高温で実施される焼結ステップを含む方法。【選択図】図２Ｂ
PROCESS FOR PREPARING CERAMIC, CERAMIC THUS OBTAINED AND USE THEREOF, PARTICULARLY AS SPATTERING TARGET
セラミック調製方法、かくして得られるセラミックならびに特にスパッタリング標的としてのその使用
GUY CAMPET (Autor:in) / IYAD SAADEDDIN (Autor:in) / KARIM ZAGHIB (Autor:in)
04.02.2016
Patent
Elektronische Ressource
Japanisch
SPATTERING TARGET, METAL OXIDE PRODUCING METHOD, AND SPATTERING TARGET MANUFACTURING METHOD
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