Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
SPUTTERING TARGET, TRANSPARENT CONDUCTIVE OXIDE THIN FILM AND CONDUCTIVE FILM
PROBLEM TO BE SOLVED: To provide a transparent conductive oxide thin film higher in light transmittance and conductivity.SOLUTION: The sputtering target including ZnO of 65-88 mol%, GaOof 10-25 mol% and at least one kind of oxides selected from MgO, CaO and BaO has a structure which particles using GaOas a principal component and particles using at least one kind of oxides selected from MgO, CaO and BaO as a principal component are dispersed in a matrix using ZnO as a principal component. The total content of MgO, CaO and BaO is 1-17 mol %, and both of the particles using GaOas a principal component and the particles using the at least one kind of oxides selected from MgO, CaO and BaO as a principal component have an average particle size of 1.5-10 μm.SELECTED DRAWING: Figure 1
【課題】より高い光線透過性及び導電性を有する透明導電性酸化物薄膜を提供すること。【解決手段】６５〜８８モル％のＺｎＯと１０〜２５モル％のＧａ２Ｏ３とを含み、更にＭｇＯ、ＣａＯ、ＢａＯから選ばれた少なくとも１種類の酸化物を含有したスパッタリングターゲットであって、ＭｇＯ、ＣａＯ、及びＢａＯの含有量の総和は１〜１７モル％であり、ＺｎＯを主成分とするマトリクス中にＧａ２Ｏ３を主成分とする粒子とＭｇＯ、ＣａＯ、及びＢａＯから選ばれた少なくとも１種類の酸化物を主成分とする粒子とが分散した構造を有し、Ｇａ２Ｏ３を主成分とする粒子とＭｇＯ、ＣａＯ、及びＢａＯから選ばれた少なくとも１種類の酸化物を主成分とする粒子の平均粒径が共に１．５〜１０μｍであるスパッタリングターゲット。【選択図】図１
SPUTTERING TARGET, TRANSPARENT CONDUCTIVE OXIDE THIN FILM AND CONDUCTIVE FILM
PROBLEM TO BE SOLVED: To provide a transparent conductive oxide thin film higher in light transmittance and conductivity.SOLUTION: The sputtering target including ZnO of 65-88 mol%, GaOof 10-25 mol% and at least one kind of oxides selected from MgO, CaO and BaO has a structure which particles using GaOas a principal component and particles using at least one kind of oxides selected from MgO, CaO and BaO as a principal component are dispersed in a matrix using ZnO as a principal component. The total content of MgO, CaO and BaO is 1-17 mol %, and both of the particles using GaOas a principal component and the particles using the at least one kind of oxides selected from MgO, CaO and BaO as a principal component have an average particle size of 1.5-10 μm.SELECTED DRAWING: Figure 1
【課題】より高い光線透過性及び導電性を有する透明導電性酸化物薄膜を提供すること。【解決手段】６５〜８８モル％のＺｎＯと１０〜２５モル％のＧａ２Ｏ３とを含み、更にＭｇＯ、ＣａＯ、ＢａＯから選ばれた少なくとも１種類の酸化物を含有したスパッタリングターゲットであって、ＭｇＯ、ＣａＯ、及びＢａＯの含有量の総和は１〜１７モル％であり、ＺｎＯを主成分とするマトリクス中にＧａ２Ｏ３を主成分とする粒子とＭｇＯ、ＣａＯ、及びＢａＯから選ばれた少なくとも１種類の酸化物を主成分とする粒子とが分散した構造を有し、Ｇａ２Ｏ３を主成分とする粒子とＭｇＯ、ＣａＯ、及びＢａＯから選ばれた少なくとも１種類の酸化物を主成分とする粒子の平均粒径が共に１．５〜１０μｍであるスパッタリングターゲット。【選択図】図１
SPUTTERING TARGET, TRANSPARENT CONDUCTIVE OXIDE THIN FILM AND CONDUCTIVE FILM
スパッタリングターゲット、透明導電性酸化物薄膜、及び導電性フィルム
KIUCHI KENICHI (Autor:in) / KAWAGUCHI YUKIO (Autor:in) / IINO MINORU (Autor:in)
23.05.2016
Patent
Elektronische Ressource
Japanisch
SPUTTERING TARGET, TRANSPARENT CONDUCTIVE OXIDE THIN FILM, AND CONDUCTIVE FILM
| Europäisches Patentamt | 2016
SPUTTERING TARGET, TRANSPARENT CONDUCTIVE OXIDE THIN FILM, AND CONDUCTIVE FILM
| Europäisches Patentamt | 2016