Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
CUTOFF MECHANISM, CUTOFF WORK SPACE FORMING DEVICE, AND CUTOFF WORK SPACE FORMING METHOD
PROBLEM TO BE SOLVED: To obtain sufficient seal surface pressure.SOLUTION: A cutoff mechanism comprises a first seal layer 21 in which a contact face 21a capable of contacting with a seal objective face 101b is formed, and which has elasticity, and a second seal layer 22 which is integrally formed at the first seal layer 21 at a side opposite to the contact face 21a of the first seal layer 21. When a load G is imparted toward the seal objective face 101b side, and the contact face 21a of the first seal layer 21 contacts with the seal objective face 101b, a relationship of a displacement amount ΔX1 of the first seal layer 21, a displacement amount ΔX2 of the second seal layer 22, a spring constant k1 of the first seal layer 21, and a spring constant k2 of the second seal layer 22 is set as k1.ΔX1=k2.ΔX2, and a relationship of the spring constant k1 and the spring constant k2 is set as k1
【課題】十分なシール面圧を得る。【解決手段】シール対象面１０１ｂに接触可能な接触面２１ａが形成された弾性を有する第一シール層２１と、第一シール層２１の接触面２１ａと相反する側で第一シール層２１と一体に設けられた第二シール層２２と、を備え、シール対象面１０１ｂ側に向けて荷重Ｇが付与されて第一シール層２１の接触面２１ａがシール対象面１０１ｂに接触する場合、第一シール層２１の変位量ΔＸ１と、第二シール層２２の変位量ΔＸ２と、第一シール層２１のバネ定数ｋ１と、第二シール層２２のバネ定数ｋ２との関係をｋ１・ΔＸ１＝ｋ２・ΔＸ２とし、バネ定数ｋ１とバネ定数ｋ２との関係をｋ１＜ｋ２とする。【選択図】図９
CUTOFF MECHANISM, CUTOFF WORK SPACE FORMING DEVICE, AND CUTOFF WORK SPACE FORMING METHOD
PROBLEM TO BE SOLVED: To obtain sufficient seal surface pressure.SOLUTION: A cutoff mechanism comprises a first seal layer 21 in which a contact face 21a capable of contacting with a seal objective face 101b is formed, and which has elasticity, and a second seal layer 22 which is integrally formed at the first seal layer 21 at a side opposite to the contact face 21a of the first seal layer 21. When a load G is imparted toward the seal objective face 101b side, and the contact face 21a of the first seal layer 21 contacts with the seal objective face 101b, a relationship of a displacement amount ΔX1 of the first seal layer 21, a displacement amount ΔX2 of the second seal layer 22, a spring constant k1 of the first seal layer 21, and a spring constant k2 of the second seal layer 22 is set as k1.ΔX1=k2.ΔX2, and a relationship of the spring constant k1 and the spring constant k2 is set as k1
【課題】十分なシール面圧を得る。【解決手段】シール対象面１０１ｂに接触可能な接触面２１ａが形成された弾性を有する第一シール層２１と、第一シール層２１の接触面２１ａと相反する側で第一シール層２１と一体に設けられた第二シール層２２と、を備え、シール対象面１０１ｂ側に向けて荷重Ｇが付与されて第一シール層２１の接触面２１ａがシール対象面１０１ｂに接触する場合、第一シール層２１の変位量ΔＸ１と、第二シール層２２の変位量ΔＸ２と、第一シール層２１のバネ定数ｋ１と、第二シール層２２のバネ定数ｋ２との関係をｋ１・ΔＸ１＝ｋ２・ΔＸ２とし、バネ定数ｋ１とバネ定数ｋ２との関係をｋ１＜ｋ２とする。【選択図】図９
CUTOFF MECHANISM, CUTOFF WORK SPACE FORMING DEVICE, AND CUTOFF WORK SPACE FORMING METHOD
止水機構、止水作業空間形成装置および止水作業空間形成方法
KOMATSU NAOTAKA (Autor:in) / UEHARA HIDEKAZU (Autor:in) / KAMO KAZUHIKO (Autor:in) / OSABE MASAHIRO (Autor:in) / KAMIMOTO SHINJI (Autor:in) / NAKATSUKASA YUYA (Autor:in)
11.01.2018
Patent
Elektronische Ressource
Japanisch
FLUID PIPE OPEN HOLE CUTOFF WORK METHOD AND FLUID PIPE CUTOFF DEVICE
| Europäisches Patentamt | 2017