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SILICON-NITRIDE-CONTAINING SEPARATING LAYER HAVING HIGH HARDNESS
PROBLEM TO BE SOLVED: To provide a shaped body comprising a substrate with a firmly adhering silicon nitride-containing separating layer, which is resistant to abrasion, impact, and scratch as well as thermally stable, for use as melt crucibles used in silicon processing of battery for a solar cell.SOLUTION: A shaped body comprises a substrate with a firmly adhering separating layer. The separating layer comprises: 92 to 98 wt.%, preferably 94 to 98 wt.%, further preferably more than 95 wt.% and 97 wt.% or less, of silicon nitride (SiN); 2 to 8 wt.%, preferably 2 to 6 wt.%, further preferably 3 to less than 5 wt.%, of silicon dioxide (SiO); and up to 150 ppm of a residual content of a dopant including an alkali metal compound in the form of flux. The separating layer has a total oxygen content of less than 5 wt.% and a hardness of at least 10 HB 2.5/3 according to DIN EN ISO 6506-1.SELECTED DRAWING: None
【課題】太陽電池の電池用シリコン加工に用いる溶融坩堝に使用する、摩耗、衝撃及びスクラッチに対する耐性があり、且つ温度安定性である堅固に接着する窒化珪素含有剥離層を有する基材を含む成形物品の提供【解決手段】しっかりと接着する剥離層を有する基材を含み、前記剥離層は、92〜98重量%、好ましくは94〜98重量%、より好ましくは95超〜97重量%の窒化ケイ素(Si3N4)及び2〜8重量%、好ましくは2〜6重量%、より好ましくは、3〜5重量%未満の二酸化ケイ素(SiO2)及び融剤の形態でのアルカリ金属化合物を含むドーパントの残留含有量150ppm以下を含み、かつ、5重量%未満の合計酸素含有量、及びDIN EN ISO6506−1により、少なくとも10HB2.5/3の硬度を有する成形物品。【選択図】なし
SILICON-NITRIDE-CONTAINING SEPARATING LAYER HAVING HIGH HARDNESS
PROBLEM TO BE SOLVED: To provide a shaped body comprising a substrate with a firmly adhering silicon nitride-containing separating layer, which is resistant to abrasion, impact, and scratch as well as thermally stable, for use as melt crucibles used in silicon processing of battery for a solar cell.SOLUTION: A shaped body comprises a substrate with a firmly adhering separating layer. The separating layer comprises: 92 to 98 wt.%, preferably 94 to 98 wt.%, further preferably more than 95 wt.% and 97 wt.% or less, of silicon nitride (SiN); 2 to 8 wt.%, preferably 2 to 6 wt.%, further preferably 3 to less than 5 wt.%, of silicon dioxide (SiO); and up to 150 ppm of a residual content of a dopant including an alkali metal compound in the form of flux. The separating layer has a total oxygen content of less than 5 wt.% and a hardness of at least 10 HB 2.5/3 according to DIN EN ISO 6506-1.SELECTED DRAWING: None
【課題】太陽電池の電池用シリコン加工に用いる溶融坩堝に使用する、摩耗、衝撃及びスクラッチに対する耐性があり、且つ温度安定性である堅固に接着する窒化珪素含有剥離層を有する基材を含む成形物品の提供【解決手段】しっかりと接着する剥離層を有する基材を含み、前記剥離層は、92〜98重量%、好ましくは94〜98重量%、より好ましくは95超〜97重量%の窒化ケイ素(Si3N4)及び2〜8重量%、好ましくは2〜6重量%、より好ましくは、3〜5重量%未満の二酸化ケイ素(SiO2)及び融剤の形態でのアルカリ金属化合物を含むドーパントの残留含有量150ppm以下を含み、かつ、5重量%未満の合計酸素含有量、及びDIN EN ISO6506−1により、少なくとも10HB2.5/3の硬度を有する成形物品。【選択図】なし
SILICON-NITRIDE-CONTAINING SEPARATING LAYER HAVING HIGH HARDNESS
優れた硬度の窒化ケイ素含有剥離層
UIBEL KRISHNA (Autor:in) / DAVID W WORTHEY (Autor:in)
18.01.2018
Patent
Elektronische Ressource
Japanisch
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