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CERAMIC COATING FILM AND PRODUCTION METHOD THEREOF
To provide a ceramic coating film achieving both of bending strength and damage tolerance.SOLUTION: A ceramic coating film 100 is a ceramic coating film formed on one plane 101a of a substrate 101, and comprises: a first phase 102 which is mainly formed of a high melting point ceramic material whose melting point is equal to or greater than 2000°C and equal to or lower than 2900°C and covers one plane 101a of the substrate; and a second phase 103 which is dispersed in the first phase 102 in a stripe state, and is mainly formed of a hafnium oxide. The high melting point ceramic material and the hafnium oxide form an eutectic structure.SELECTED DRAWING: Figure 1
【課題】曲げ強度と損傷許容性を両立させたセラミックス被膜を提供する。【解決手段】本発明のセラミックス被膜100は、基材101の一面101aに形成されるセラミックス被膜であって、基材の一面101aを覆い、融点が2000℃以上2900℃以下である高融点セラミックス材料を主成分とする第一相102と、第一相102の内部に筋状に分布し、酸化ハフニウムを主成分とする第二相103と、を備え、高融点セラミックス材料と前記酸化ハフニウムとが、共晶構造を形成している。【選択図】図1
CERAMIC COATING FILM AND PRODUCTION METHOD THEREOF
To provide a ceramic coating film achieving both of bending strength and damage tolerance.SOLUTION: A ceramic coating film 100 is a ceramic coating film formed on one plane 101a of a substrate 101, and comprises: a first phase 102 which is mainly formed of a high melting point ceramic material whose melting point is equal to or greater than 2000°C and equal to or lower than 2900°C and covers one plane 101a of the substrate; and a second phase 103 which is dispersed in the first phase 102 in a stripe state, and is mainly formed of a hafnium oxide. The high melting point ceramic material and the hafnium oxide form an eutectic structure.SELECTED DRAWING: Figure 1
【課題】曲げ強度と損傷許容性を両立させたセラミックス被膜を提供する。【解決手段】本発明のセラミックス被膜100は、基材101の一面101aに形成されるセラミックス被膜であって、基材の一面101aを覆い、融点が2000℃以上2900℃以下である高融点セラミックス材料を主成分とする第一相102と、第一相102の内部に筋状に分布し、酸化ハフニウムを主成分とする第二相103と、を備え、高融点セラミックス材料と前記酸化ハフニウムとが、共晶構造を形成している。【選択図】図1
CERAMIC COATING FILM AND PRODUCTION METHOD THEREOF
セラミックス被膜とその製造方法
ITO AKIHIKO (Autor:in) / MATSUMOTO SHOGEN (Autor:in)
07.10.2021
Patent
Elektronische Ressource
Japanisch
IPC:
C04B
Kalk
,
LIME
/
C01F
COMPOUNDS OF THE METALS BERYLLIUM, MAGNESIUM, ALUMINIUM, CALCIUM, STRONTIUM, BARIUM, RADIUM, THORIUM, OR OF THE RARE-EARTH METALS
,
Verbindungen der Metalle Beryllium, Magnesium, Aluminium, Calcium, Strontium, Barium, Radium, Thorium oder der Seltenen Erden
/
C01G
Verbindungen der von den Unterklassen C01D oder C01F nicht umfassten Metalle
,
COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
/
C23C
Beschichten metallischer Werkstoffe
,
COATING METALLIC MATERIAL
CERAMIC COMPOSITE COATING AND PRODUCTION METHOD THEREOF
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