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HIGHLY ZIRCONIA-BASED REFRACTORY AND MELTING FURNACE
고온에 있어서의 전기 저항률이 커서, 승온시에 내화물 표면이 부분적으로 결락되는 칩 오프 현상을 나타내지 않고, 또한 용융된 저알칼리 유리와의 접촉에 있어서도 성분의 누출이 적기 때문에, 조업시에 균열이 잘 발생하지 않는, 전기 용융 가마용으로 적합한 고지르코니아질 내화물을 제공한다. 화학 성분으로서, 질량% 로, ZrO를 내부 백분율로 85 ∼ 95 %, SiO를 내부 백분율로 3.0 ∼ 10 %, AlO를 내부 백분율로 0.85 ∼ 3.0 %, NaO 를 실질적으로 함유하지 않고, KO 를 외부 백분율로 0.01 ∼ 0.5 %, SrO 를 내부 백분율로 1.5 ∼ 3.0 %, 그리고 NbO및/또는 TaO를 「(NbO의 함유량) + (TaO의 함유량/1.66)」에 의해 얻어지는 값으로 하여 내부 백분율로 0.1 ∼ 2.0 % 함유하는 고지르코니아질 내화물.
To provide a highly zirconia-based refractory suitable for an electric melting furnace, which has a high electrical resistivity and does not exhibit a chipping off phenomenon such that the refractory surface partially chips off during temperature rise and which is scarcely susceptible to extraction of components even when in contact with molten low alkali glass and, hence, is less susceptible to cracking during operation. A highly zirconia-based refractory comprising, as chemical components by mass%, from 85 to 95% of ZrO 2 in terms of inner percentage, from 3.0 to 10% of SiO 2 in terms of inner percentage, from 0.85 to 3.0% of Al 2 O 3 in terms of inner percentage, substantially no Na 2 O, from 0.01 to 0.5% of K 2 O in terms of outer percentage, from 1.5 to 3.0% of SrO in terms of inner percentage, and from 0.1 to 2.0% of Nb 2 O 5 and/or Ta 2 O 5 as a value obtained by "(Nb 2 O 5 content)+(Ta 2 O 5 content/1.66)", in terms of inner percentage.
HIGHLY ZIRCONIA-BASED REFRACTORY AND MELTING FURNACE
고온에 있어서의 전기 저항률이 커서, 승온시에 내화물 표면이 부분적으로 결락되는 칩 오프 현상을 나타내지 않고, 또한 용융된 저알칼리 유리와의 접촉에 있어서도 성분의 누출이 적기 때문에, 조업시에 균열이 잘 발생하지 않는, 전기 용융 가마용으로 적합한 고지르코니아질 내화물을 제공한다. 화학 성분으로서, 질량% 로, ZrO를 내부 백분율로 85 ∼ 95 %, SiO를 내부 백분율로 3.0 ∼ 10 %, AlO를 내부 백분율로 0.85 ∼ 3.0 %, NaO 를 실질적으로 함유하지 않고, KO 를 외부 백분율로 0.01 ∼ 0.5 %, SrO 를 내부 백분율로 1.5 ∼ 3.0 %, 그리고 NbO및/또는 TaO를 「(NbO의 함유량) + (TaO의 함유량/1.66)」에 의해 얻어지는 값으로 하여 내부 백분율로 0.1 ∼ 2.0 % 함유하는 고지르코니아질 내화물.
To provide a highly zirconia-based refractory suitable for an electric melting furnace, which has a high electrical resistivity and does not exhibit a chipping off phenomenon such that the refractory surface partially chips off during temperature rise and which is scarcely susceptible to extraction of components even when in contact with molten low alkali glass and, hence, is less susceptible to cracking during operation. A highly zirconia-based refractory comprising, as chemical components by mass%, from 85 to 95% of ZrO 2 in terms of inner percentage, from 3.0 to 10% of SiO 2 in terms of inner percentage, from 0.85 to 3.0% of Al 2 O 3 in terms of inner percentage, substantially no Na 2 O, from 0.01 to 0.5% of K 2 O in terms of outer percentage, from 1.5 to 3.0% of SrO in terms of inner percentage, and from 0.1 to 2.0% of Nb 2 O 5 and/or Ta 2 O 5 as a value obtained by "(Nb 2 O 5 content)+(Ta 2 O 5 content/1.66)", in terms of inner percentage.
HIGHLY ZIRCONIA-BASED REFRACTORY AND MELTING FURNACE
고지르코니아질 내화물 및 용융 가마
13.02.2017
Patent
Elektronische Ressource
Koreanisch
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