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Method for preparing dielectric having low dielectric loss and dielectric prepared thereby
The present invention relates to: a method for manufacturing a dielectric capable of manufacturing a frequency-invariant dielectric having a low dielectric loss, which has the low dielectric loss due to a narrow variation in dielectric properties due to temperature and invariant dielectric properties according to frequency; and the dielectric manufactured by the same. The dielectric according to the present invention can be applied to passive devices of IT products which require high temperature stability.
본 발명은 온도에 의한 유전 특성의 변동이 좁고, 주파수에 따른 유전특성이 불변하여, 낮은 유전손실을 갖는 저유전손실의 주파수 불변의 유전체를 제조할 수 있는 유전체의 제조방법 및 이에 따라 제조되는 유전체에 관한 것이다.
Method for preparing dielectric having low dielectric loss and dielectric prepared thereby
The present invention relates to: a method for manufacturing a dielectric capable of manufacturing a frequency-invariant dielectric having a low dielectric loss, which has the low dielectric loss due to a narrow variation in dielectric properties due to temperature and invariant dielectric properties according to frequency; and the dielectric manufactured by the same. The dielectric according to the present invention can be applied to passive devices of IT products which require high temperature stability.
본 발명은 온도에 의한 유전 특성의 변동이 좁고, 주파수에 따른 유전특성이 불변하여, 낮은 유전손실을 갖는 저유전손실의 주파수 불변의 유전체를 제조할 수 있는 유전체의 제조방법 및 이에 따라 제조되는 유전체에 관한 것이다.
Method for preparing dielectric having low dielectric loss and dielectric prepared thereby
낮은 유전손실을 갖는 유전체의 제조방법 및 이에 따라 제조되는 유전체
CHUNG SUNG YOON (Autor:in) / AN JI SANG (Autor:in)
28.09.2020
Patent
Elektronische Ressource
Koreanisch
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