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    pellicle frame for extreme ultraviolet and pellicle for extreme ultraviolet comprising same

    Neue Suche nach: SONG KI SUNG
    Neue Suche nach: LEE HUN HO

    The present invention relates to a pellicle frame for extreme ultraviolet rays and a pellicle for extreme ultraviolet rays including the same, and more specifically, to a pellicle frame for extreme ultraviolet rays having a low absorption coefficient in the region of extreme ultraviolet rays (wavelength of 13.5 nm), preventing scattering of exposure light, and having excellent mechanical properties.

    본 발명은 초극자외선용 펠리클 프레임 및 이를 포함하는 초극자외선용 펠리클에 관한 것으로서, 보다 상세하게는 초극자외선(13.5nm의 파장) 영역에서의 흡광계수가 낮고, 노광 광의 산란을 방지할 수 있을 뿐만 아니라, 기계적 물성 또한 우수한 초극자외선용 펠리클 프레임에 관한 것이다.

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    pellicle frame for extreme ultraviolet and pellicle for extreme ultraviolet comprising same

    Neue Suche nach: SONG KI SUNG
    Neue Suche nach: LEE HUN HO

    The present invention relates to a pellicle frame for extreme ultraviolet rays and a pellicle for extreme ultraviolet rays including the same, and more specifically, to a pellicle frame for extreme ultraviolet rays having a low absorption coefficient in the region of extreme ultraviolet rays (wavelength of 13.5 nm), preventing scattering of exposure light, and having excellent mechanical properties.

    본 발명은 초극자외선용 펠리클 프레임 및 이를 포함하는 초극자외선용 펠리클에 관한 것으로서, 보다 상세하게는 초극자외선(13.5nm의 파장) 영역에서의 흡광계수가 낮고, 노광 광의 산란을 방지할 수 있을 뿐만 아니라, 기계적 물성 또한 우수한 초극자외선용 펠리클 프레임에 관한 것이다.

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    pellicle frame for extreme ultraviolet and pellicle for extreme ultraviolet comprising same

    Neue Suche nach: SONG KI SUNG
    Neue Suche nach: LEE HUN HO

    The present invention relates to a pellicle frame for extreme ultraviolet rays and a pellicle for extreme ultraviolet rays including the same, and more specifically, to a pellicle frame for extreme ultraviolet rays having a low absorption coefficient in the region of extreme ultraviolet rays (wavelength of 13.5 nm), preventing scattering of exposure light, and having excellent mechanical properties.

    본 발명은 초극자외선용 펠리클 프레임 및 이를 포함하는 초극자외선용 펠리클에 관한 것으로서, 보다 상세하게는 초극자외선(13.5nm의 파장) 영역에서의 흡광계수가 낮고, 노광 광의 산란을 방지할 수 있을 뿐만 아니라, 기계적 물성 또한 우수한 초극자외선용 펠리클 프레임에 관한 것이다.

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    Titel:

    pellicle frame for extreme ultraviolet and pellicle for extreme ultraviolet comprising same

    Weitere Titelangaben:

    초극자외선용 펠리클 프레임 및 이를 포함하는 초극자외선용 펠리클

    Beteiligte:

    SONG KI SUNG (Autor:in) / LEE HUN HO (Autor:in)

    Erscheinungsdatum:

    28.02.2023

    Medientyp:

    Patent

    Format:

    Elektronische Ressource

    Sprache:

    Koreanisch

    Klassifikation:

    IPC:  G03F Fotomechanische Herstellung strukturierter oder gemusterter Oberflächen, z.B. zum Drucken, zum Herstellen von Halbleiterbauelementen , PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES / C04B Kalk , LIME

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