Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Zirconium, hafnium, titanium precursors and deposition of group 4 containing films using the same
wherein M is Ti, Zr, or Hf; each A is independently N, Si, B or P; each E is independently C, Si, B or P; m and n is independently 0, 1 or 2; m+n>1; each R is independently a H or a C1-C4 hydrocarbon group; each L is independently a −1 anionic ligand selected from the group consisting of NR′2, OR′, Cp, amidinate, β-diketonate, or keto-iminate, wherein R′ is a H or a C1-C4 hydrocarbon group; and L′ is NR″ or O, wherein R″ is a H or a C1-C4 hydrocarbon group. Also disclosed are methods of synthesizing and using the disclosed precursors to deposit Group 4 transition metal-containing films on one or more substrates via vapor deposition processes.
Zirconium, hafnium, titanium precursors and deposition of group 4 containing films using the same
wherein M is Ti, Zr, or Hf; each A is independently N, Si, B or P; each E is independently C, Si, B or P; m and n is independently 0, 1 or 2; m+n>1; each R is independently a H or a C1-C4 hydrocarbon group; each L is independently a −1 anionic ligand selected from the group consisting of NR′2, OR′, Cp, amidinate, β-diketonate, or keto-iminate, wherein R′ is a H or a C1-C4 hydrocarbon group; and L′ is NR″ or O, wherein R″ is a H or a C1-C4 hydrocarbon group. Also disclosed are methods of synthesizing and using the disclosed precursors to deposit Group 4 transition metal-containing films on one or more substrates via vapor deposition processes.
Zirconium, hafnium, titanium precursors and deposition of group 4 containing films using the same
GATINEAU SATOKO (Autor:in) / NOH WONTAE (Autor:in) / KIM DAEHYEON (Autor:in) / GATINEAU JULIEN (Autor:in) / GIRARD JEAN-MARC (Autor:in)
19.01.2021
Patent
Elektronische Ressource
Englisch
IPC:
C07F
Acyclische, carbocyclische oder heterocyclische Verbindungen, die andere Elemente als Kohlenstoff, Wasserstoff, Halogen, Sauerstoff, Stickstoff, Schwefel, Selen oder Tellur enthalten
,
ACYCLIC, CARBOCYCLIC, OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
/
C04B
Kalk
,
LIME
/
C23C
Beschichten metallischer Werkstoffe
,
COATING METALLIC MATERIAL
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