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GAS DISTRIBUTION FOR CHEMICAL VAPOR DEPOSITION/INFILTRATION

SHE YING / MENON NAVEEN G / DARDAS ZISSIS A / FILBURN THOMAS P / CAI XIAODAN

A gas distribution plate for a chemical vapor deposition/infiltration system includes a body having a first side and a second side opposite the first side. The body may be hollow and may define an internal cavity. The gas distribution plate may also include a plurality of pass-through tubes extending through the internal cavity, a cavity inlet, and a plurality of cavity outlets. A reaction gas may be configured to flow through the plurality of pass-through tubes and a gaseous mitigation agent may be configured to flow into the internal cavity via the cavity inlet and out of the internal cavity via the plurality of cavity outlets to mix with reaction gas.

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GAS DISTRIBUTION FOR CHEMICAL VAPOR DEPOSITION/INFILTRATION

SHE YING / MENON NAVEEN G / DARDAS ZISSIS A / FILBURN THOMAS P / CAI XIAODAN

A gas distribution plate for a chemical vapor deposition/infiltration system includes a body having a first side and a second side opposite the first side. The body may be hollow and may define an internal cavity. The gas distribution plate may also include a plurality of pass-through tubes extending through the internal cavity, a cavity inlet, and a plurality of cavity outlets. A reaction gas may be configured to flow through the plurality of pass-through tubes and a gaseous mitigation agent may be configured to flow into the internal cavity via the cavity inlet and out of the internal cavity via the plurality of cavity outlets to mix with reaction gas.

GAS DISTRIBUTION FOR CHEMICAL VAPOR DEPOSITION/INFILTRATION

SHE YING / MENON NAVEEN G / DARDAS ZISSIS A / FILBURN THOMAS P / CAI XIAODAN

A gas distribution plate for a chemical vapor deposition/infiltration system includes a body having a first side and a second side opposite the first side. The body may be hollow and may define an internal cavity. The gas distribution plate may also include a plurality of pass-through tubes extending through the internal cavity, a cavity inlet, and a plurality of cavity outlets. A reaction gas may be configured to flow through the plurality of pass-through tubes and a gaseous mitigation agent may be configured to flow into the internal cavity via the cavity inlet and out of the internal cavity via the plurality of cavity outlets to mix with reaction gas.

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Titel:

GAS DISTRIBUTION FOR CHEMICAL VAPOR DEPOSITION/INFILTRATION

Beteiligte:

SHE YING (Autor:in) / MENON NAVEEN G (Autor:in) / DARDAS ZISSIS A (Autor:in) / FILBURN THOMAS P (Autor:in) / CAI XIAODAN (Autor:in)

Erscheinungsdatum:

21.03.2019

Medientyp:

Patent

Format:

Elektronische Ressource

Sprache:

Englisch

Klassifikation:

IPC: C23C Beschichten metallischer Werkstoffe , COATING METALLIC MATERIAL / C04B Kalk , LIME

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