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SPARK PLASMA SINTERED COMPONENT FOR PLASMA PROCESSING CHAMBER
A method for making a component for use in a plasma processing chamber is provided. A non-oxide silicon containing powder composition is placed in a mold, wherein the non-oxide silicon containing powder composition consists essentially of a non-oxide silicon containing powder and at least one of a B or B4C dopant. The non-oxide silicon containing powder composition is subjected to spark plasma sintering (SPS) to form a spark plasma sintered component. The spark plasma sintered component is machined into a plasma processing chamber component.
SPARK PLASMA SINTERED COMPONENT FOR PLASMA PROCESSING CHAMBER
A method for making a component for use in a plasma processing chamber is provided. A non-oxide silicon containing powder composition is placed in a mold, wherein the non-oxide silicon containing powder composition consists essentially of a non-oxide silicon containing powder and at least one of a B or B4C dopant. The non-oxide silicon containing powder composition is subjected to spark plasma sintering (SPS) to form a spark plasma sintered component. The spark plasma sintered component is machined into a plasma processing chamber component.
SPARK PLASMA SINTERED COMPONENT FOR PLASMA PROCESSING CHAMBER
XU LIN (Autor:in) / SINGH HARMEET (Autor:in) / HAZARIKA PANKAJ (Autor:in) / SRINIVASAN SATISH (Autor:in) / KOSHY ROBIN (Autor:in)
19.10.2023
Patent
Elektronische Ressource
Englisch
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