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Eine Plattform für die Wissenschaft: Bauingenieurwesen, Architektur und Urbanistik
Apparatus for coating nanoparticles having core-shell structure using atomic layer deposition
Disclosed is a coating chamber having a process passage in which a coating process is performed, a particle supply means configured to supply nanoparticles into the process passage, a gas supply means configured to supply a carrier gas and a reactive gas serving as a source of a shell material into the process passage, and a low pressure forming means configured to form a low pressure in the process passage. The coating chamber has a speed adjustment member formed of a porous material or a grid and installed in the process passage, and as a moving speed of the nanoparticles is decreased due to flow resistance or collision of the nanoparticles passing through the speed adjustment member, first and second precursors supplied as the reactive gas move more rapidly than the nanoparticles to coat a thin film on the nanoparticles with the material.
Apparatus for coating nanoparticles having core-shell structure using atomic layer deposition
Disclosed is a coating chamber having a process passage in which a coating process is performed, a particle supply means configured to supply nanoparticles into the process passage, a gas supply means configured to supply a carrier gas and a reactive gas serving as a source of a shell material into the process passage, and a low pressure forming means configured to form a low pressure in the process passage. The coating chamber has a speed adjustment member formed of a porous material or a grid and installed in the process passage, and as a moving speed of the nanoparticles is decreased due to flow resistance or collision of the nanoparticles passing through the speed adjustment member, first and second precursors supplied as the reactive gas move more rapidly than the nanoparticles to coat a thin film on the nanoparticles with the material.
Apparatus for coating nanoparticles having core-shell structure using atomic layer deposition
PARK SUNGHO (Autor:in) / CHAE WON-SEOK (Autor:in) / HAN MAN SO (Autor:in)
15.08.2017
Patent
Elektronische Ressource
Englisch
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