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Stabilization of High-Tc Phase in Sputtered BiPbSrCaCuO Films by Post Anneal
Abstract The post anneal was investigated for amorphous (Bi,Pb)2Sr2Ca2Cu3Ox films deposited on (100) planes of MgO at about 400°C. The films were annealed in a closed Pt crucible together with a sintered bulk including Pb to supply enough constituent metal atoms in vapor. Also the film surface was covered by a MgO plate to suppress a change of the film composition during anneal. The film which contained the high-Tc phase above 70 % was obtained and the maximum Tc of zero resistance attained up 105 K. The results obtained revealed that the addition of Pb and/or the reduced pressure of oxygen were effective to promote the growth of the high-Tc phase under the conditions ensuring the stoichiometry during anneal.
Stabilization of High-Tc Phase in Sputtered BiPbSrCaCuO Films by Post Anneal
Abstract The post anneal was investigated for amorphous (Bi,Pb)2Sr2Ca2Cu3Ox films deposited on (100) planes of MgO at about 400°C. The films were annealed in a closed Pt crucible together with a sintered bulk including Pb to supply enough constituent metal atoms in vapor. Also the film surface was covered by a MgO plate to suppress a change of the film composition during anneal. The film which contained the high-Tc phase above 70 % was obtained and the maximum Tc of zero resistance attained up 105 K. The results obtained revealed that the addition of Pb and/or the reduced pressure of oxygen were effective to promote the growth of the high-Tc phase under the conditions ensuring the stoichiometry during anneal.
Stabilization of High-Tc Phase in Sputtered BiPbSrCaCuO Films by Post Anneal
Yamamoto, H. (Autor:in) / Katoh, M. (Autor:in) / Tanaka, M. (Autor:in) / Aoki, Y. (Autor:in) / Maeda, K. (Autor:in) / Shiono, T. (Autor:in)
01.01.1990
7 pages
Aufsatz/Kapitel (Buch)
Elektronische Ressource
Englisch
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