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    F321 A Molecular Simulation of Water Vapor Adsorption into Ordered Mesoporous Silica

    New search for: Shirono, K.
    New search for: Yoshino, K.
    New search for: Daiguji, H.

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    F321 A Molecular Simulation of Water Vapor Adsorption into Ordered Mesoporous Silica

    New search for: Shirono, K.
    New search for: Yoshino, K.
    New search for: Daiguji, H.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    F321 A Molecular Simulation of Water Vapor Adsorption into Ordered Mesoporous Silica

    New search for: Shirono, K.
    New search for: Yoshino, K.
    New search for: Daiguji, H.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

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    Document information
    Title:

    F321 A Molecular Simulation of Water Vapor Adsorption into Ordered Mesoporous Silica

    Contributors:

    Shirono, K. (author) / Yoshino, K. (author) / Daiguji, H. (author)

    Conference:

    National symposium; 42nd, 42nd national heat transfer symposium of Japan ; 2005 ; Sendai, Japan

    Published in:

    42nd national heat transfer symposium of Japan ; 633-634

    NATIONAL HEAT TRANSFER SYMPOSIUM OF JAPAN ; 3

    Publication date:

    2005-01-01

    Size:

    2 pages

    Remarks:

    Vol 3 of 3

    ISSN:

    1346-1524

    Type of media:

    Conference paper

    Type of material:

    Print

    Language:

    Japanese

    Keywords:

    Heat transfer

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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