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    The Influence of Formaldehyde/Phenol Ratio on Properties of Foamable Phenolic Resin and Phenolic Foam

    New search for: Zhang, W.
    New search for: Ma, Y.F.
    New search for: Chu, F.X.
    New search for: Wang, C.P.
    New search for: Li, G.

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    The Influence of Formaldehyde/Phenol Ratio on Properties of Foamable Phenolic Resin and Phenolic Foam

    New search for: Zhang, W.
    New search for: Ma, Y.F.
    New search for: Chu, F.X.
    New search for: Wang, C.P.
    New search for: Li, G.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    The Influence of Formaldehyde/Phenol Ratio on Properties of Foamable Phenolic Resin and Phenolic Foam

    New search for: Zhang, W.
    New search for: Ma, Y.F.
    New search for: Chu, F.X.
    New search for: Wang, C.P.
    New search for: Li, G.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    The Influence of Formaldehyde/Phenol Ratio on Properties of Foamable Phenolic Resin and Phenolic Foam

    Contributors:

    Zhang, W. (author) / Ma, Y.F. (author) / Chu, F.X. (author) / Wang, C.P. (author) / Li, G.

    Conference:

    Conference, Advanced building materials ; 2011 ; Haikou, China

    Published in:

    Advanced building materials ; 523-527

    ADVANCED MATERIALS RESEARCH -ZUG- ; 250/253

    Publication date:

    2011-01-01

    Size:

    5 pages

    Remarks:

    Includes bibliographical references and index

    ISBN:

    9783037851272

    ISSN:

    1022-6680

    Type of media:

    Conference paper

    Type of material:

    Print

    Language:

    English

    Keywords:

    Technology , Engineering , Engineering materials , Energy , Management , Control , Information technology

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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