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    Electrodeposition of a Copper-Tellurium Compound under Diffusion-Limiting Control

    New search for: Ishizaki, T.
    New search for: Yata, D.
    New search for: Fuwa, A.

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    Electrodeposition of a Copper-Tellurium Compound under Diffusion-Limiting Control

    New search for: Ishizaki, T.
    New search for: Yata, D.
    New search for: Fuwa, A.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Electrodeposition of a Copper-Tellurium Compound under Diffusion-Limiting Control

    New search for: Ishizaki, T.
    New search for: Yata, D.
    New search for: Fuwa, A.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Electrodeposition of a Copper-Tellurium Compound under Diffusion-Limiting Control

    Contributors:

    Ishizaki, T. (author) / Yata, D. (author) / Fuwa, A. (author)

    Published in:

    MATERIALS TRANSACTIONS ; 44 ; 1583-1587

    Publication date:

    2003-01-01

    Size:

    5 pages

    ISSN:

    1345-9678

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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