Ag thin film growth on hydrogen-terminated Si(100) surface studied by TOF-ICISS: Fid-Bau Portal

Ag thin film growth on hydrogen-terminated Si(100) surface studied by TOF-ICISS

Tanaka, Y. / Kinoshita, T. / Sumitomo, K. / Shoji, F.

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Ag thin film growth on hydrogen-terminated Si(100) surface studied by TOF-ICISS

Tanaka, Y. / Kinoshita, T. / Sumitomo, K. / Shoji, F.

Ag thin film growth on hydrogen-terminated Si(100) surface studied by TOF-ICISS

Tanaka, Y. / Kinoshita, T. / Sumitomo, K. / Shoji, F.

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Order at Subito €

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Document information

Title:

Ag thin film growth on hydrogen-terminated Si(100) surface studied by TOF-ICISS

Contributors:

Tanaka, Y. (author) / Kinoshita, T. (author) / Sumitomo, K. (author) / Shoji, F. (author)

Published in:

APPLIED SURFACE SCIENCE ; 60 ; 195

Publication date:

1992-01-01

Size:

195 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

Unknown

Classification:

DDC: 621.35

Kinoshita, T. / Tanaka, Y. / Sumitomo, K. et al. | British Library Online Contents | 1992

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Ryu, J.-T. / Kui, K. / Tanaka, Y. et al. | British Library Online Contents | 1997

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