Diffusion of elements implanted in amorphous titanium disilicide: Fid-Bau Portal

Diffusion of elements implanted in amorphous titanium disilicide

D'Heurle, F. M. / Cotte, J. / Gas, P. / Goeltz, G.

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Diffusion of elements implanted in amorphous titanium disilicide

D'Heurle, F. M. / Cotte, J. / Gas, P. / Goeltz, G.

Diffusion of elements implanted in amorphous titanium disilicide

D'Heurle, F. M. / Cotte, J. / Gas, P. / Goeltz, G.

Access

Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Diffusion of elements implanted in amorphous titanium disilicide

Contributors:

D'Heurle, F. M. (author) / Cotte, J. (author) / Gas, P. (author) / Goeltz, G. (author) / Janssen, G. C. A. M. / Jongste, J. F. / Radelaar, S.

Published in:

Proceedings of the Fifth European Workshop on Refractory Metals and Silicides ; 167

APPLIED SURFACE SCIENCE ; 72

Publication date:

1993-01-01

Size:

167 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

Unknown

Classification:

DDC: 621.35

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