Measurements of interdiffusion in compositionally modulated amorphous Ni/Si multilayers by in situ X-ray diffraction: Fid-Bau Portal

Measurements of interdiffusion in compositionally modulated amorphous Ni/Si multilayers by in situ X-ray diffraction

Wang, W. H. / Bai, H. Y. / Chen, H. / Zhang, Y.

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Measurements of interdiffusion in compositionally modulated amorphous Ni/Si multilayers by in situ X-ray diffraction

Wang, W. H. / Bai, H. Y. / Chen, H. / Zhang, Y.

Measurements of interdiffusion in compositionally modulated amorphous Ni/Si multilayers by in situ X-ray diffraction

Wang, W. H. / Bai, H. Y. / Chen, H. / Zhang, Y.

Access

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Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Measurements of interdiffusion in compositionally modulated amorphous Ni/Si multilayers by in situ X-ray diffraction

Contributors:

Wang, W. H. (author) / Bai, H. Y. (author) / Chen, H. (author) / Zhang, Y. (author)

Published in:

MATERIALS SCIENCE AND ENGINEERING -LAUSANNE- B ; 22 ; 211

Publication date:

1994-01-01

Size:

211 pages

ISSN:

0921-5107

Type of media:

Article (Journal)

Type of material:

Language:

Unknown

Classification:

DDC: 620.11

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