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    TEM and in situ HREM for Studying Metal-Semiconductor Interfacial Reactions

    New search for: Sinclair, R.
    New search for: Konno, T. J.
    New search for: Hong Ko, D.
    New search for: Limoge, Y.
    New search for: Bocquet, J. L.

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    TEM and in situ HREM for Studying Metal-Semiconductor Interfacial Reactions

    New search for: Sinclair, R.
    New search for: Konno, T. J.
    New search for: Hong Ko, D.
    New search for: Limoge, Y.
    New search for: Bocquet, J. L.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    TEM and in situ HREM for Studying Metal-Semiconductor Interfacial Reactions

    New search for: Sinclair, R.
    New search for: Konno, T. J.
    New search for: Hong Ko, D.
    New search for: Limoge, Y.
    New search for: Bocquet, J. L.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    TEM and in situ HREM for Studying Metal-Semiconductor Interfacial Reactions

    Contributors:

    Sinclair, R. (author) / Konno, T. J. (author) / Hong Ko, D. (author) / Limoge, Y. / Bocquet, J. L.

    Published in:

    Reactive Phase Formation at Interfaces and Diffusion Processes ; 111

    MATERIALS SCIENCE FORUM

    Publication date:

    1994-01-01

    Size:

    111 pages

    ISSN:

    0255-5476

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    Unknown

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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