Characterization of PbTiO~3 thin films deposited on Pt/Ti/SiO~2/Si substrates by ECR PECVD: Fid-Bau Portal

Characterization of PbTiO~3 thin films deposited on Pt/Ti/SiO~2/Si substrates by ECR PECVD

Chung, S.-W. / Shin, J.-S. / Kim, J.-W. / No, K.

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Characterization of PbTiO~3 thin films deposited on Pt/Ti/SiO~2/Si substrates by ECR PECVD

Chung, S.-W. / Shin, J.-S. / Kim, J.-W. / No, K.

Characterization of PbTiO~3 thin films deposited on Pt/Ti/SiO~2/Si substrates by ECR PECVD

Chung, S.-W. / Shin, J.-S. / Kim, J.-W. / No, K.

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Check availability in my library

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Document information

Title:

Characterization of PbTiO~3 thin films deposited on Pt/Ti/SiO~2/Si substrates by ECR PECVD

Contributors:

Chung, S.-W. (author) / Shin, J.-S. (author) / Kim, J.-W. (author) / No, K. (author)

Published in:

JOURNAL OF MATERIALS RESEARCH -PITTSBURGH- ; 10 ; 447

Publication date:

1995-01-01

Size:

447 pages

ISSN:

0884-2914

Type of media:

Article (Journal)

Type of material:

Language:

Unknown

Classification:

DDC: 620.11

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