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    Pressure-pulsed chemical vapour infiltration of SiC to porous carbon from a gas system SiCl~4-CH~4-H~2

    New search for: Sugiyama, K.
    New search for: Kishida, T.

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    Pressure-pulsed chemical vapour infiltration of SiC to porous carbon from a gas system SiCl~4-CH~4-H~2

    New search for: Sugiyama, K.
    New search for: Kishida, T.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Pressure-pulsed chemical vapour infiltration of SiC to porous carbon from a gas system SiCl~4-CH~4-H~2

    New search for: Sugiyama, K.
    New search for: Kishida, T.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

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    Check availability in my library
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    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Pressure-pulsed chemical vapour infiltration of SiC to porous carbon from a gas system SiCl~4-CH~4-H~2

    Contributors:

    Sugiyama, K. (author) / Kishida, T. (author)

    Published in:

    JOURNAL OF MATERIALS SCIENCE ; 31 ; 3661-3665

    Publication date:

    1996-01-01

    Size:

    5 pages

    ISSN:

    0022-2461

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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