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    Atomically flat, ultra thin-SiO~2/Si(001) interface formation by UHV heating

    New search for: Niwa, M.
    New search for: Okada, K.
    New search for: Sinclair, R.

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    Atomically flat, ultra thin-SiO~2/Si(001) interface formation by UHV heating

    New search for: Niwa, M.
    New search for: Okada, K.
    New search for: Sinclair, R.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Atomically flat, ultra thin-SiO~2/Si(001) interface formation by UHV heating

    New search for: Niwa, M.
    New search for: Okada, K.
    New search for: Sinclair, R.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

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    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Atomically flat, ultra thin-SiO~2/Si(001) interface formation by UHV heating

    Contributors:

    Niwa, M. (author) / Okada, K. (author) / Sinclair, R. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 99 ; 425-430

    Publication date:

    1996-01-01

    Size:

    6 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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