Hydrogen ion treatments of oxidized GaAs(100) and AlGaAs(100) surfaces: surface stoichiometry and electronic properties: Fid-Bau Portal

Hydrogen ion treatments of oxidized GaAs(100) and AlGaAs(100) surfaces: surface stoichiometry and electronic properties

Chang, Y.-L. / Yi, S. I. / Shi, S. / Hu, E. / Weinberg, W. H. / Merz, J.

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Hydrogen ion treatments of oxidized GaAs(100) and AlGaAs(100) surfaces: surface stoichiometry and electronic properties

Chang, Y.-L. / Yi, S. I. / Shi, S. / Hu, E. / Weinberg, W. H. / Merz, J.

Hydrogen ion treatments of oxidized GaAs(100) and AlGaAs(100) surfaces: surface stoichiometry and electronic properties

Chang, Y.-L. / Yi, S. I. / Shi, S. / Hu, E. / Weinberg, W. H. / Merz, J.

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Document information

Title:

Hydrogen ion treatments of oxidized GaAs(100) and AlGaAs(100) surfaces: surface stoichiometry and electronic properties

Contributors:

Chang, Y.-L. (author) / Yi, S. I. (author) / Shi, S. (author) / Hu, E. (author) / Weinberg, W. H. (author) / Merz, J. (author)

Published in:

APPLIED SURFACE SCIENCE ; 104/105 ; 422-427

Publication date:

1996-01-01

Size:

6 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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