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    Structural relaxation of SiO~2/Si interfacial layer during annealing

    New search for: Awaji, N.
    New search for: Ohkubo, S.
    New search for: Nakanishi, T.
    New search for: Takasaki, K.
    New search for: Komiya, S.

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    Structural relaxation of SiO~2/Si interfacial layer during annealing

    New search for: Awaji, N.
    New search for: Ohkubo, S.
    New search for: Nakanishi, T.
    New search for: Takasaki, K.
    New search for: Komiya, S.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Structural relaxation of SiO~2/Si interfacial layer during annealing

    New search for: Awaji, N.
    New search for: Ohkubo, S.
    New search for: Nakanishi, T.
    New search for: Takasaki, K.
    New search for: Komiya, S.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Structural relaxation of SiO~2/Si interfacial layer during annealing

    Contributors:

    Awaji, N. (author) / Ohkubo, S. (author) / Nakanishi, T. (author) / Takasaki, K. (author) / Komiya, S. (author)

    Published in:

    APPLIED SURFACE SCIENCE ; 117/118 ; 221-244

    Publication date:

    1997-01-01

    Size:

    24 pages

    ISSN:

    0169-4332

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.35

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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