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Ion Implantation Induced Damage Accumulation Studied by Rutherford Backscattering Spectrometry and Spectroscopic Ellipsometry
Ion Implantation Induced Damage Accumulation Studied by Rutherford Backscattering Spectrometry and Spectroscopic Ellipsometry
Ion Implantation Induced Damage Accumulation Studied by Rutherford Backscattering Spectrometry and Spectroscopic Ellipsometry
Lohner, T. (author) / Khanh, N. Q. (author) / Petrik, P. (author) / Fried, M. (author) / Kotai, E. (author) / Gyulai, J. (author) / Balogh, A. G. / Walter, G.
1997-01-01
4 pages
Article (Journal)
English
DDC:
620.11
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