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Characteristics of TiN film deposited on stellite using reactive magnetron sputter ion plating

Lee, M.-K. / Kang, H.-S. / Kim, W.-W. / Kim, J.-S. / Lee, W.-J.

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Characteristics of TiN film deposited on stellite using reactive magnetron sputter ion plating

Lee, M.-K. / Kang, H.-S. / Kim, W.-W. / Kim, J.-S. / Lee, W.-J.

Characteristics of TiN film deposited on stellite using reactive magnetron sputter ion plating

Lee, M.-K. / Kang, H.-S. / Kim, W.-W. / Kim, J.-S. / Lee, W.-J.

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Check availability in my library

Order at Subito €

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Document information

Title:

Characteristics of TiN film deposited on stellite using reactive magnetron sputter ion plating

Contributors:

Lee, M.-K. (author) / Kang, H.-S. (author) / Kim, W.-W. (author) / Kim, J.-S. (author) / Lee, W.-J. (author)

Published in:

JOURNAL OF MATERIALS RESEARCH -PITTSBURGH- ; 12 ; 2393-2400

Publication date:

1997-01-01

Size:

8 pages

ISSN:

0884-2914

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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