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Molecular beam epitaxy of SiGe heterostructures using a newly designed Si effusion cell

Yaguchi, H. / Yamamoto, T. / Shiraki, Y.

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Molecular beam epitaxy of SiGe heterostructures using a newly designed Si effusion cell

Yaguchi, H. / Yamamoto, T. / Shiraki, Y.

Molecular beam epitaxy of SiGe heterostructures using a newly designed Si effusion cell

Yaguchi, H. / Yamamoto, T. / Shiraki, Y.

Access

Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Molecular beam epitaxy of SiGe heterostructures using a newly designed Si effusion cell

Contributors:

Yaguchi, H. (author) / Yamamoto, T. (author) / Shiraki, Y. (author)

Published in:

MATERIALS SCIENCE AND ENGINEERING -LAUSANNE- B ; 51 ; 170-172

Publication date:

1998-01-01

Size:

3 pages

ISSN:

0921-5107

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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