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Chemical alteration of thin alumina films on aluminum during hydrogen-atom exposures

Epling, W. S. / Mount, C. K. / Hoflund, G. B. / Young, V. Y.

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Chemical alteration of thin alumina films on aluminum during hydrogen-atom exposures

Epling, W. S. / Mount, C. K. / Hoflund, G. B. / Young, V. Y.

Chemical alteration of thin alumina films on aluminum during hydrogen-atom exposures

Epling, W. S. / Mount, C. K. / Hoflund, G. B. / Young, V. Y.

Access

Access via TIB

Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Chemical alteration of thin alumina films on aluminum during hydrogen-atom exposures

Contributors:

Epling, W. S. (author) / Mount, C. K. (author) / Hoflund, G. B. (author) / Young, V. Y. (author)

Published in:

APPLIED SURFACE SCIENCE ; 126 ; 235-240

Publication date:

1998-01-01

Size:

6 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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