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Microstructuring of Molecularly Thin Polymer Layers by Photolithography

Prucker, O. / Schimmel, M. / Tovar, G. / Knoll, W. / Ruehe, J.

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Microstructuring of Molecularly Thin Polymer Layers by Photolithography

Prucker, O. / Schimmel, M. / Tovar, G. / Knoll, W. / Ruehe, J.

Microstructuring of Molecularly Thin Polymer Layers by Photolithography

Prucker, O. / Schimmel, M. / Tovar, G. / Knoll, W. / Ruehe, J.

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Check availability in my library

Order at Subito €

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Document information

Title:

Microstructuring of Molecularly Thin Polymer Layers by Photolithography

Contributors:

Prucker, O. (author) / Schimmel, M. (author) / Tovar, G. (author) / Knoll, W. (author) / Ruehe, J. (author)

Published in:

ADVANCED MATERIALS -DEERFIELD BEACH- ; 10 ; 1073-1077

Publication date:

1998-01-01

Size:

5 pages

ISSN:

0935-9648

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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