Low temperature oxidation of fully dense and porous MoSi~2: Fid-Bau Portal

Low temperature oxidation of fully dense and porous MoSi~2

Kurokawa, K. / Houzumi, H. / Saeki, I. / Takahashi, H.

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Low temperature oxidation of fully dense and porous MoSi~2

Kurokawa, K. / Houzumi, H. / Saeki, I. / Takahashi, H.

Low temperature oxidation of fully dense and porous MoSi~2

Kurokawa, K. / Houzumi, H. / Saeki, I. / Takahashi, H.

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Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Low temperature oxidation of fully dense and porous MoSi~2

Contributors:

Kurokawa, K. (author) / Houzumi, H. (author) / Saeki, I. (author) / Takahashi, H. (author)

Published in:

MATERIALS SCIENCE AND ENGINEERING -LAUSANNE- A ; 261 ; 292-299

Publication date:

1999-01-01

Size:

8 pages

ISSN:

0921-5093

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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Low temperature oxidation behavior of a MoSi~2-based material

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