Dendrimer-Based Self-Assembled Monolayers as Resists for Scanning Probe Lithography: Fid-Bau Portal

Dendrimer-Based Self-Assembled Monolayers as Resists for Scanning Probe Lithography

Tully, D. C. / Wilder, K. / Frechet, J. M. J. / Trimble, A. R. / Quate, C. F.

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Dendrimer-Based Self-Assembled Monolayers as Resists for Scanning Probe Lithography

Tully, D. C. / Wilder, K. / Frechet, J. M. J. / Trimble, A. R. / Quate, C. F.

Dendrimer-Based Self-Assembled Monolayers as Resists for Scanning Probe Lithography

Tully, D. C. / Wilder, K. / Frechet, J. M. J. / Trimble, A. R. / Quate, C. F.

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Document information

Title:

Dendrimer-Based Self-Assembled Monolayers as Resists for Scanning Probe Lithography

Contributors:

Tully, D. C. (author) / Wilder, K. (author) / Frechet, J. M. J. (author) / Trimble, A. R. (author) / Quate, C. F. (author)

Published in:

ADVANCED MATERIALS -DEERFIELD BEACH- ; 11 ; 314-318

Publication date:

1999-01-01

Size:

5 pages

ISSN:

0935-9648

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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