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    Film microstructure-deposition condition relationships in the growth of epitaxial NiO films by metalorganic chemical vapor deposition on oxide and metal substrates

    New search for: Wang, A.
    New search for: Belot, J. A.
    New search for: Marks, T. J.

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    Film microstructure-deposition condition relationships in the growth of epitaxial NiO films by metalorganic chemical vapor deposition on oxide and metal substrates

    New search for: Wang, A.
    New search for: Belot, J. A.
    New search for: Marks, T. J.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Film microstructure-deposition condition relationships in the growth of epitaxial NiO films by metalorganic chemical vapor deposition on oxide and metal substrates

    New search for: Wang, A.
    New search for: Belot, J. A.
    New search for: Marks, T. J.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
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    Document information
    Similar titles

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    Document information
    Title:

    Film microstructure-deposition condition relationships in the growth of epitaxial NiO films by metalorganic chemical vapor deposition on oxide and metal substrates

    Contributors:

    Wang, A. (author) / Belot, J. A. (author) / Marks, T. J. (author)

    Published in:

    JOURNAL OF MATERIALS RESEARCH -PITTSBURGH- ; 14 ; 1132-1136

    Publication date:

    1999-01-01

    Size:

    5 pages

    ISSN:

    0884-2914

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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