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Graded Dielectric Thin Films Prepared by Chemical Solution Deposition

Hoffmann, S. / Liedtke, R. / Slowak, R. / Hasenkox, U. / Waser, R.

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Graded Dielectric Thin Films Prepared by Chemical Solution Deposition

Hoffmann, S. / Liedtke, R. / Slowak, R. / Hasenkox, U. / Waser, R.

Graded Dielectric Thin Films Prepared by Chemical Solution Deposition

Hoffmann, S. / Liedtke, R. / Slowak, R. / Hasenkox, U. / Waser, R.

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Order at Subito €

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Document information

Title:

Graded Dielectric Thin Films Prepared by Chemical Solution Deposition

Contributors:

Hoffmann, S. (author) / Liedtke, R. (author) / Slowak, R. (author) / Hasenkox, U. (author) / Waser, R. (author) / Kaysser, W. A.

Published in:

Functionally Graded Materials 1998: Proceedings of the 5th International Symposium on Functionally Graded Materials, held in New Town Hall, Dresden, Germany, October 26-29, 1998 ; 544-548

MATERIALS SCIENCE FORUM ; 308/311

Publication date:

1999-01-01

Size:

5 pages

ISSN:

0255-5476

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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