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    The influence of yttrium ion implantation on the oxidation behavior of Zircaloy-4 at 600 C

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    New search for: Wu, J.
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    New search for: Fan, Y.

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    The influence of yttrium ion implantation on the oxidation behavior of Zircaloy-4 at 600 C

    New search for: He, F.
    New search for: Bai, X.
    New search for: Wu, J.
    New search for: Wang, S.
    New search for: An, J.
    New search for: Sun, Z.
    New search for: Fan, Y.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    The influence of yttrium ion implantation on the oxidation behavior of Zircaloy-4 at 600 C

    New search for: He, F.
    New search for: Bai, X.
    New search for: Wu, J.
    New search for: Wang, S.
    New search for: An, J.
    New search for: Sun, Z.
    New search for: Fan, Y.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    The influence of yttrium ion implantation on the oxidation behavior of Zircaloy-4 at 600 C

    Contributors:

    He, F. (author) / Bai, X. (author) / Wu, J. (author) / Wang, S. (author) / An, J. (author) / Sun, Z. (author) / Fan, Y. (author)

    Published in:

    JOURNAL OF MATERIALS SCIENCE LETTERS ; 18 ; 715-718

    Publication date:

    1999-01-01

    Size:

    4 pages

    ISSN:

    0261-8028

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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