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Large-grained polycrystalline Si films obtained by selective nucleation and solid phase epitaxy

Puglisi, R. A. / Tanabe, H. / Chen, C. M. / Atwater, H. A.

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Large-grained polycrystalline Si films obtained by selective nucleation and solid phase epitaxy

Puglisi, R. A. / Tanabe, H. / Chen, C. M. / Atwater, H. A.

Large-grained polycrystalline Si films obtained by selective nucleation and solid phase epitaxy

Puglisi, R. A. / Tanabe, H. / Chen, C. M. / Atwater, H. A.

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Check availability in my library

Order at Subito €

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Document information

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Document information

Title:

Large-grained polycrystalline Si films obtained by selective nucleation and solid phase epitaxy

Contributors:

Puglisi, R. A. (author) / Tanabe, H. (author) / Chen, C. M. (author) / Atwater, H. A. (author)

Published in:

MATERIALS SCIENCE AND ENGINEERING -LAUSANNE- B ; 73 ; 212 - 217

Publication date:

2000-01-01

Size:

6 pages

ISSN:

0921-5107

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 620.11

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