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    Control and Manipulation of Residual Gases during RF Magnetron Sputter Deposition of Calcium Phosphate Coatings

    New search for: Love, E. R.
    New search for: Weimper, M.
    New search for: Boyd, A.
    New search for: Akay, M.
    New search for: Meenan, B. J.

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    Control and Manipulation of Residual Gases during RF Magnetron Sputter Deposition of Calcium Phosphate Coatings

    New search for: Love, E. R.
    New search for: Weimper, M.
    New search for: Boyd, A.
    New search for: Akay, M.
    New search for: Meenan, B. J.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Control and Manipulation of Residual Gases during RF Magnetron Sputter Deposition of Calcium Phosphate Coatings

    New search for: Love, E. R.
    New search for: Weimper, M.
    New search for: Boyd, A.
    New search for: Akay, M.
    New search for: Meenan, B. J.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Control and Manipulation of Residual Gases during RF Magnetron Sputter Deposition of Calcium Phosphate Coatings

    Contributors:

    Love, E. R. (author) / Weimper, M. (author) / Boyd, A. (author) / Akay, M. (author) / Meenan, B. J. (author)

    Published in:

    KEY ENGINEERING MATERIALS ; 255-258

    Publication date:

    2001-01-01

    Size:

    4 pages

    ISSN:

    1013-9826

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  620.11

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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