A platform for research: civil engineering, architecture and urbanism
Microstructure and preferred orientation in rf sputter deposited AIN thin film
Microstructure and preferred orientation in rf sputter deposited AIN thin film
Microstructure and preferred orientation in rf sputter deposited AIN thin film
Fujiki, M. (author) / Takahashi, M. (author) / Kikkawa, S. (author) / Kanamaru, F. (author)
JOURNAL OF MATERIALS SCIENCE LETTERS ; 19 ; 1625-1628
2000-01-01
4 pages
Article (Journal)
English
DDC:
620.11
© Metadata Copyright the British Library Board and other contributors. All rights reserved.
British Library Online Contents | 1994
|Cell adhesion on NiTi thin film sputter-deposited meshes
British Library Online Contents | 2016
|Microstructural characterization of sputter-deposited Pt thin film electrode
British Library Online Contents | 2004
|Reliability Studies on Sputter Deposited Barium Strontium Titanate Thin Film Capacitors
British Library Conference Proceedings | 2005
|Preferred orientation in PbZrO3 thin film prepared by sol-gel technique
British Library Online Contents | 2000
|