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    Multiple internal reflection spectroscopy: a sensitive non-destructive probe for interfaces and nanometric layers

    New search for: Olivier, M.
    New search for: Rochat, N.
    New search for: Chabli, A.
    New search for: Lefeuvre, G.
    New search for: Conne, F.

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    Multiple internal reflection spectroscopy: a sensitive non-destructive probe for interfaces and nanometric layers

    New search for: Olivier, M.
    New search for: Rochat, N.
    New search for: Chabli, A.
    New search for: Lefeuvre, G.
    New search for: Conne, F.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Multiple internal reflection spectroscopy: a sensitive non-destructive probe for interfaces and nanometric layers

    New search for: Olivier, M.
    New search for: Rochat, N.
    New search for: Chabli, A.
    New search for: Lefeuvre, G.
    New search for: Conne, F.

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Access

    Access via TIB
    Check availability in my library
    Order at Subito €

    Page navigation

    Document information
    Similar titles

    Export, share and cite

    Document information
    Title:

    Multiple internal reflection spectroscopy: a sensitive non-destructive probe for interfaces and nanometric layers

    Contributors:

    Olivier, M. (author) / Rochat, N. (author) / Chabli, A. (author) / Lefeuvre, G. (author) / Conne, F. (author)

    Published in:

    MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING ; 4 ; 15-18

    Publication date:

    2001-01-01

    Size:

    4 pages

    ISSN:

    1369-8001

    Type of media:

    Article (Journal)

    Type of material:

    Print

    Language:

    English

    Classification:

    DDC:  621.38152

    © Metadata Copyright the British Library Board and other contributors. All rights reserved.

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