XRD and Raman study of vanadium oxide thin films deposited on fused silica substrates by RF magnetron sputtering: Fid-Bau Portal

XRD and Raman study of vanadium oxide thin films deposited on fused silica substrates by RF magnetron sputtering

Wang, X. J. / Li, H. D. / Fei, Y. J. / Wang, X. / Xiong, Y. Y. / Nie, Y. X. / Feng, K. A.

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XRD and Raman study of vanadium oxide thin films deposited on fused silica substrates by RF magnetron sputtering

Wang, X. J. / Li, H. D. / Fei, Y. J. / Wang, X. / Xiong, Y. Y. / Nie, Y. X. / Feng, K. A.

XRD and Raman study of vanadium oxide thin films deposited on fused silica substrates by RF magnetron sputtering

Wang, X. J. / Li, H. D. / Fei, Y. J. / Wang, X. / Xiong, Y. Y. / Nie, Y. X. / Feng, K. A.

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Document information

Title:

XRD and Raman study of vanadium oxide thin films deposited on fused silica substrates by RF magnetron sputtering

Contributors:

Wang, X. J. (author) / Li, H. D. (author) / Fei, Y. J. (author) / Wang, X. (author) / Xiong, Y. Y. (author) / Nie, Y. X. (author) / Feng, K. A. (author)

Published in:

APPLIED SURFACE SCIENCE ; 177 ; 8-14

Publication date:

2001-01-01

Size:

7 pages

ISSN:

0169-4332

Type of media:

Article (Journal)

Type of material:

Language:

English

Classification:

DDC: 621.35

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