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Cracking mechanism in AlN(11&unknown;20)/alpha-Al~2O~3(1&unknown;102) heteroepitaxial films grown by MOCVD
Cracking mechanism in AlN(11&unknown;20)/alpha-Al~2O~3(1&unknown;102) heteroepitaxial films grown by MOCVD
Cracking mechanism in AlN(11&unknown;20)/alpha-Al~2O~3(1&unknown;102) heteroepitaxial films grown by MOCVD
Kaigawa, K. (author) / Shibata, T. (author) / Nakamura, Y. (author) / Asai, K. (author) / Tanaka, M. (author) / Sakai, H. (author) / Tsurumi, T. (author)
JOURNAL OF MATERIALS SCIENCE ; 36 ; 4649-4660
2001-01-01
12 pages
Article (Journal)
English
DDC:
620.11
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|Heisst &unknown;zugelassen&unknown; auch &unknown;zulassig&unknown;?
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|Tokio Prada &unknown;Epicenter&unknown;
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Dezentrales, &unknown;intelligentes&unknown; RWA-Netz
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